Gas Flow Validation Using Precision Orifice and Choked Flow

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Solution Overview

Problem

Current methods for verifying gas flow rates in plasma processing, such as the rate of rise (ROR) procedure, are time-consuming, inaccurate, and costly, and existing external flow measurement devices can only test inert gases, failing to account for real gases and their compressibility, thus not providing a comprehensive validation of mass flow controllers (MFCs).

Innovation Solution

The precision orifice method and calibrated orifice method measure upstream pressure in a choked flow condition to calculate the actual flow rate and percentage error, using accurate gas tables and calibration factors to correct for orifice geometry and gas properties, allowing for quick, accurate, and cost-effective validation of gas delivery systems without requiring extensive chamber cooling or separate proprietary systems.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If the rate of rise (ROR) procedure is used to verify gas flow rates, then flow rate validation is achieved, but the process becomes time-consuming and costly

Engineering Contradiction:
Improveflow rate validation accuracyVSAvoidverification time
Core Design Contradiction:
Measurement precisionVSLoss of time

Solution Approach 1:

The patent extracts the flow verification measurement from the large reaction chamber to a small external chamber or flow measurement standard. This separation allows rapid measurements to be performed outside the production chamber, eliminating the time penalty from chamber cooling and setup while maintaining measurement accuracy through standardized measurement conditions.

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The patent introduces an intermediary flow measurement standard or external chamber that acts as a mediator between the MFC and the reaction chamber. This intermediary device provides a controlled environment for accurate flow measurements without requiring the reaction chamber to be taken offline, thus reducing verification time while maintaining precision.

Inventive Principle:
Principle #24Intermediary (Mediator)

2Productivity

If external flow measurement devices are used, then measurement speed is improved, but the devices can only test inert gases and fail to account for real gases and their compressibility

Engineering Contradiction:
Improveverification speedVSAvoidgas type compatibility
Core Design Contradiction:
ProductivityVSAdaptability or versatility

Solution Approach 1:

The patent applies parameter changes by introducing compressibility correction factors that adjust the flow measurements based on the specific gas being tested. By modifying the measurement parameters to account for gas-specific properties such as compressibility, the system maintains high verification speed while becoming adaptable to various gas types including reactive gases used in actual production.

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent enhances the universality of the external flow measurement device by incorporating correction capabilities for different gas properties. The measurement system is designed to handle both inert calibration gases and reactive process gases by applying appropriate correction factors, making the device versatile for all gas types while maintaining rapid verification capability.

Inventive Principle:
Principle #6Universality (Multi-functionality)

3Measurement precision

If MFC verification is performed in a controlled laboratory environment using inert gas, then measurement accuracy is achieved, but conversion to production gas results introduce errors

Engineering Contradiction:
Improvelaboratory verification accuracyVSAvoidproduction environment accuracy
Core Design Contradiction:
Measurement precisionVSReliability

Solution Approach 1:

The patent implements feedback by using the external flow measurement standard to continuously verify and correct MFC performance. The system establishes a feedback loop where actual flow measurements are compared against MFC readings, and correction factors are applied to ensure accuracy translates from laboratory calibration to production environment operation.

Inventive Principle:
Principle #23Feedback

Solution Approach 2:

The patent applies preliminary action by performing flow verification measurements in advance using the external standard before production runs. This preliminary verification establishes accurate baseline data and correction factors that can be applied during production, ensuring reliability without requiring repeated laboratory-style verifications that introduce conversion errors.

Inventive Principle:
Principle #10Preliminary action

4Reliability

If the reaction chamber volume is used for flow verification, then comprehensive system validation is achieved, but the large volume requires extensive cooling time

Engineering Contradiction:
Improvesystem validation comprehensivenessVSAvoidchamber cooling time
Core Design Contradiction:
ReliabilityVSLoss of time

Solution Approach 1:

The patent segments the verification function from the reaction chamber by using a separate external flow measurement standard or small external chamber. This segmentation allows the verification function to be performed independently without affecting the reaction chamber schedule, eliminating cooling time requirements while maintaining comprehensive validation through separate but correlated measurements.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent creates a simplified copy of the flow measurement function using an external chamber or flow standard that replicates the essential measurement capability without the complexity and thermal mass of the full reaction chamber. This copy provides sufficient validation data without requiring chamber cooling, thus maintaining reliability while reducing time loss.

Inventive Principle:
Principle #26Copying

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

These methods provide a rapid, accurate, and cost-effective means to validate gas flow rates, reducing downtime and ownership costs by focusing on orifice measurements, accounting for real gases, and integrating with plasma processing systems, thus improving the accuracy and efficiency of gas delivery in semiconductor manufacturing.

Implementation Method 1

measuring an upstream pressure of an orifice under choked flow condition

Methodology Applied
Scientific EffectChoked flow:

Data Source

PatentUS8521461B2Apparatus for delivering a process gas
Publication Date: 2013.08.27 LAM RES CORP
  • US8521461B2 patent drawing
  • US8521461B2 patent drawing
  • US8521461B2 patent drawing

AI summary

A processing system for delivering a process gas to a reaction chamber using a recipe having a recipe flow rate is provided. The processing system includes a gas flow delivery system configured for delivering the process gas, wherein said gas flow delivery system controlled by a mass flow controller (MFC) to an orifice. The predicted flow rate is previously computed by pressurizing a gas. The predicted flow rate further being previously computed measuring a set of upstream pressure values of the gas via at least one sensor. The processing system also includes a programmed computing device configured for applying a calibration factor of a set of calibration factors to determine the predicted flow rate, the calibration factor being a ratio of an average of the set of upstream pressure values to an average of a set of golden upstream pressure values.