Gas Flow Validation Using Precision Orifice and Choked Flow
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Solution Overview
Problem
Current methods for verifying gas flow rates in plasma processing, such as the rate of rise (ROR) procedure, are time-consuming, inaccurate, and costly, and existing external flow measurement devices can only test inert gases, failing to account for real gases and their compressibility, thus not providing a comprehensive validation of mass flow controllers (MFCs).
Innovation Solution
The precision orifice method and calibrated orifice method measure upstream pressure in a choked flow condition to calculate the actual flow rate and percentage error, using accurate gas tables and calibration factors to correct for orifice geometry and gas properties, allowing for quick, accurate, and cost-effective validation of gas delivery systems without requiring extensive chamber cooling or separate proprietary systems.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If the rate of rise (ROR) procedure is used to verify gas flow rates, then flow rate validation is achieved, but the process becomes time-consuming and costly
Solution Approach 1:
The patent extracts the flow verification measurement from the large reaction chamber to a small external chamber or flow measurement standard. This separation allows rapid measurements to be performed outside the production chamber, eliminating the time penalty from chamber cooling and setup while maintaining measurement accuracy through standardized measurement conditions.
Solution Approach 2:
The patent introduces an intermediary flow measurement standard or external chamber that acts as a mediator between the MFC and the reaction chamber. This intermediary device provides a controlled environment for accurate flow measurements without requiring the reaction chamber to be taken offline, thus reducing verification time while maintaining precision.
2Productivity
If external flow measurement devices are used, then measurement speed is improved, but the devices can only test inert gases and fail to account for real gases and their compressibility
Solution Approach 1:
The patent applies parameter changes by introducing compressibility correction factors that adjust the flow measurements based on the specific gas being tested. By modifying the measurement parameters to account for gas-specific properties such as compressibility, the system maintains high verification speed while becoming adaptable to various gas types including reactive gases used in actual production.
Solution Approach 2:
The patent enhances the universality of the external flow measurement device by incorporating correction capabilities for different gas properties. The measurement system is designed to handle both inert calibration gases and reactive process gases by applying appropriate correction factors, making the device versatile for all gas types while maintaining rapid verification capability.
3Measurement precision
If MFC verification is performed in a controlled laboratory environment using inert gas, then measurement accuracy is achieved, but conversion to production gas results introduce errors
Solution Approach 1:
The patent implements feedback by using the external flow measurement standard to continuously verify and correct MFC performance. The system establishes a feedback loop where actual flow measurements are compared against MFC readings, and correction factors are applied to ensure accuracy translates from laboratory calibration to production environment operation.
Solution Approach 2:
The patent applies preliminary action by performing flow verification measurements in advance using the external standard before production runs. This preliminary verification establishes accurate baseline data and correction factors that can be applied during production, ensuring reliability without requiring repeated laboratory-style verifications that introduce conversion errors.
4Reliability
If the reaction chamber volume is used for flow verification, then comprehensive system validation is achieved, but the large volume requires extensive cooling time
Solution Approach 1:
The patent segments the verification function from the reaction chamber by using a separate external flow measurement standard or small external chamber. This segmentation allows the verification function to be performed independently without affecting the reaction chamber schedule, eliminating cooling time requirements while maintaining comprehensive validation through separate but correlated measurements.
Solution Approach 2:
The patent creates a simplified copy of the flow measurement function using an external chamber or flow standard that replicates the essential measurement capability without the complexity and thermal mass of the full reaction chamber. This copy provides sufficient validation data without requiring chamber cooling, thus maintaining reliability while reducing time loss.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
These methods provide a rapid, accurate, and cost-effective means to validate gas flow rates, reducing downtime and ownership costs by focusing on orifice measurements, accounting for real gases, and integrating with plasma processing systems, thus improving the accuracy and efficiency of gas delivery in semiconductor manufacturing.
Implementation Method 1
measuring an upstream pressure of an orifice under choked flow condition
Data Source
AI summary
A processing system for delivering a process gas to a reaction chamber using a recipe having a recipe flow rate is provided. The processing system includes a gas flow delivery system configured for delivering the process gas, wherein said gas flow delivery system controlled by a mass flow controller (MFC) to an orifice. The predicted flow rate is previously computed by pressurizing a gas. The predicted flow rate further being previously computed measuring a set of upstream pressure values of the gas via at least one sensor. The processing system also includes a programmed computing device configured for applying a calibration factor of a set of calibration factors to determine the predicted flow rate, the calibration factor being a ratio of an average of the set of upstream pressure values to an average of a set of golden upstream pressure values.


