Precursor Supply Heating Control for Stable Vapor Concentration
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing gas supply systems for semiconductor and dry coating processes face challenges in maintaining precursor concentration, accurately detecting residual amounts, and efficiently heating vessels due to complex structures, temperature control issues, and fluctuations in precursor supply, leading to inconsistent film formation and unnecessary precursor consumption.
Innovation Solution
A precursor supply system with a vessel heating unit, carrier gas heating unit, and measurement units for controlling temperature and gas flow, ensuring the precursor is supplied at the required concentration and accurately detecting residual amounts by controlling the carrier gas temperature and vessel temperature based on real-time measurements.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the vessel structure is made complex (e.g., adding trays) to increase precursor supply stability, then the precursor supply stability is improved, but the device complexity and operational difficulty increase
Solution Approach 1:
The patent extracts the heating function from the vessel structure itself and places it in a separate heating unit. This allows the vessel to remain simple while achieving stable precursor supply through controlled heating, eliminating the need for complex internal structures like trays.
Solution Approach 2:
The patent introduces a heating control unit that monitors and adjusts the heating temperature based on precursor supply conditions. This feedback mechanism ensures stable precursor vaporization and supply without requiring complex vessel structures, as the system dynamically adapts to maintain optimal conditions.
2Productivity
If the heating temperature is increased to improve precursor vaporization, then the precursor supply amount is improved, but the risk of temperature overshoot and precursor degradation increases
Solution Approach 1:
The patent employs dynamic temperature control where the heating unit adjusts its output based on real-time conditions. The heating control unit modulates the heating temperature to match the actual precursor supply needs, preventing both insufficient vaporization and dangerous overshoot conditions.
Solution Approach 2:
The patent changes the heating temperature parameter dynamically rather than maintaining a fixed high temperature. The heating control unit adjusts the temperature parameter based on precursor consumption rate and supply requirements, optimizing both productivity and safety by keeping the temperature within a controlled range.
3Reliability
If the vessel heating time is extended to ensure complete precursor vaporization, then the precursor supply completeness is improved, but the processing time and productivity are reduced
Solution Approach 1:
The patent performs preliminary heating of the vessel and precursor materials before actual precursor supply begins. The heating control unit pre-heats the system to the required temperature, ensuring that when precursor supply starts, vaporization occurs immediately and completely without delays, thus maintaining both completeness and speed.
Solution Approach 2:
The patent maintains continuous heating during the precursor supply process rather than intermittent heating. The heating unit continuously provides thermal energy to ensure complete and consistent precursor vaporization throughout the supply period, eliminating the need for extended heating cycles while maintaining supply completeness.
4Productivity
If the carrier gas flow rate is increased to improve precursor entrainment, then the precursor supply efficiency is improved, but the precursor concentration control and waste reduction become more difficult
Solution Approach 1:
The patent introduces a flow control unit that monitors and adjusts the carrier gas flow rate based on precursor supply conditions. This feedback mechanism ensures that the carrier gas flow is optimized to entrain precursor effectively while maintaining the required concentration levels, preventing both insufficient mixing and excessive waste.
Solution Approach 2:
The patent dynamically adjusts the carrier gas flow rate parameter rather than using a fixed high flow rate. The flow control unit modifies the flow rate based on precursor vaporization rate and supply requirements, optimizing the balance between supply efficiency and concentration control, thereby reducing precursor waste while maintaining productivity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system ensures stable and uniform precursor supply, reducing waste and fluctuations, allowing for precise control of precursor concentration and detection of residual amounts, thereby improving the film formation process and reducing operational costs.
Implementation Method 1
the solid material or liquid material inside the vessel is indirectly heated
Implementation Method 2
must be vaporized for supply in the case of liquid materials
Implementation Method 3
a carrier gas heating unit which is disposed in the introduction line and heats the carrier gas
Data Source
AI summary
The present invention provides a supply system enabling a precursor of a solid material or a precursor of a liquid material to be supplied to a latter process at no higher concentration than required and also at or above a predetermined concentration.A supply system 1 comprises: a vessel 11 for receiving a precursor material; a vessel heating unit for heating the vessel at a set temperature; a carrier gas heating unit which is disposed in an introduction line L1 and heats a carrier gas; a main measurement unit which is disposed in an outward conduction line L2 and obtains data relating to a gas of the precursor; and a carrier gas temperature control unit for controlling the temperature of the carrier gas heating unit in accordance with a measurement result of the main measurement unit.