Configurable Liquid Precursor Vaporizer with Segmented Channels
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Conventional vaporizers for semiconductor manufacturing often fail to achieve complete vaporization of liquid precursors due to limitations in flow path length and heat transfer efficiency, leading to incomplete precursor vaporization and subsequent defects in semiconductor wafers.
Innovation Solution
A vaporizer design featuring long, thin heated passages that maintain temperatures between the vaporization and Leidenfrost points of the precursor, with optional carrier gas injection to mechanically shear droplets, enhancing heat transfer and evaporation efficiency.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If conventional vaporizers use atomizer nozzles with heated carrier gas, then the structure is simple, but complete vaporization is not achieved due to insufficient heat transfer efficiency
Solution Approach 1:
The vaporizer is divided into multiple channels (first channels and second channels) with multiple holes distributing the precursor flow. This segmentation increases the total heat transfer surface area and ensures complete vaporization by preventing localized pooling of liquid precursor.
Solution Approach 2:
The patent transitions from a single-flow-path atomizer approach to a multi-dimensional channel network with through-holes connecting inlet and outlet areas. This three-dimensional channel structure increases residence time and heat transfer efficiency while maintaining a compact form factor.
2Volume of stationary object
If the vaporizer package volume is reduced, then the device is more compact, but heat transfer efficiency may be insufficient for complete vaporization
Solution Approach 1:
The channels are formed within the walls and structure of the vaporizer body itself, nesting the heat transfer pathways within the package volume. The first channels and second channels are integrated into the vaporizer plate structure, maximizing utilization of available space.
Solution Approach 2:
By creating three-dimensional channel networks with through-holes that span multiple layers of the vaporizer plate, the design increases effective heat transfer volume without proportionally increasing the external package dimensions.
3Productivity
If the channel temperature is increased above vaporization temperature, then vaporization speed increases, but the Leidenfrost effect occurs reducing heat transfer efficiency
Solution Approach 1:
The patent optimizes the channel temperature parameter to operate in the optimal range between vaporization temperature and Leidenfrost temperature. This parameter optimization ensures maximum heat transfer efficiency while maintaining complete vaporization, avoiding the insulating vapor layer formation that occurs at higher temperatures.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This design achieves complete vaporization of precursors within a smaller package volume, reducing defects and improving wafer uniformity by optimizing heat transfer and residence time.
Implementation Method 1
one or more heater elements configured to heat the channels above the vaporization temperature of the precursor
Implementation Method 2
vaporizers are necessary to vaporize the liquid precursors
Implementation Method 3
a carrier gas may be introduced to mechanically shear the precursor into droplets
Data Source
AI summary
An improved vaporizer for vaporizing a liquid precursor is provided. The vaporizer may include one or more channels with a relatively large wall-area-to-cross-sectional-flow-area ratio and may be equipped with one or more heater elements configured to heat the channels above the vaporization temperature of the precursor. At least some of the channels may be heated above the vaporization temperature but below the Leidenfrost temperature of the precursor. In some implementations, a carrier gas may be introduced at high speed in a direction generally transverse to the precursor flow to mechanically shear the precursor into droplets. Multiple vaporizers may be ganged together in series to achieve complete vaporization, if necessary. The vaporizers may be easily disassembleable for cleaning and maintenance.


