Precursor Delivery Vessel Heating for Stable Vapor Pressure
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Solution Overview
Problem
Conventional vapor delivery systems fail to meet the performance specifications required for semiconductor processing tools.
Innovation Solution
A method and system for controlling precursor delivery, involving a precursor delivery vessel with a vaporizable precursor on a tray, where the tray is made of a material with high thermal conductivity, and thermal energy is supplied to vaporize the precursor, with adjustments made to maintain the vaporized precursor's pressure within a specified range.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional vapor delivery systems are used, then the system structure is simple, but the delivery precision and pressure control performance do not meet semiconductor processing specifications
Solution Approach 1:
The patent implements dynamic thermal energy adjustment to the tray based on real-time pressure feedback. The controller continuously monitors precursor vapor pressure and adjusts the thermal energy supplied to the tray accordingly, enabling adaptive pressure control that responds to changing conditions rather than using fixed parameters.
Solution Approach 2:
The system incorporates a pressure sensor that continuously measures the pressure of vaporized precursor in the gas flow line and feeds this information back to the controller. The controller uses this feedback signal to adjust thermal energy input, creating a closed-loop control system that maintains pressure within the specified range despite variations in precursor delivery.
2Productivity
If high thermal conductivity material is used for the tray, then vaporization efficiency and pressure control improve, but manufacturing cost and material selection complexity increase
Solution Approach 1:
The patent specifies a minimum thermal conductivity parameter (greater than 15 W m−1 K−1) for the tray material to ensure adequate heat transfer for efficient precursor vaporization. This quantitative parameter specification allows for systematic material selection and comparison, balancing thermal performance requirements with manufacturing considerations.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The system effectively maintains the pressure of the vaporized precursor within a controlled range, ensuring consistent delivery and performance suitable for semiconductor processing tools.
Implementation Method 1
supplying an amount of thermal energy to the at least one tray sufficient to vaporize the vaporizable precursor
Implementation Method 2
the at least one tray comprises a material having a thermal conductivity of greater than 15 W m−1 K−1
Data Source
AI summary
Systems and methods for controlling precursor delivery. The systems and methods may comprise a precursor delivery vessel in fluid communication with a gas flow line. The precursor delivery vessel may comprise at least one tray containing a vaporizable precursor. An amount of thermal energy may be supplied to the at least one tray in an amount sufficient to vaporize the vaporizable precursor. The vaporized precursor may be dispensed from the precursor delivery vessel to the gas flow line. The amount of thermal energy supplied to the at least one tray may be adjusted sufficient to maintain a pressure of the vaporized precursor, in the gas flow line, within a pressure range.