Predictive Plasma Actuator Control for Asynchronous Power Demands
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Solution Overview
Problem
Existing plasma processing systems face challenges in efficiently controlling actuators due to differential response times and asynchronous operations, leading to overheating, premature system failure, and inefficiency, particularly in generating multi-level pulsed waveforms.
Innovation Solution
A predictive control system that includes a user interface, sensors, and a predictive control section to calculate internal control signals and adjust actuators based on internal models, addressing differential response times and asynchronous operations.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Power
If the rail voltage is held at a high level for much of a pulse cycle to ensure sufficient power for fast actuators, then the power availability for fast actuators is improved, but the DC section overheats and system reliability deteriorates
Solution Approach 1:
The control system predicts future power requirements based on the pulsed waveform pattern and proactively adjusts the DC rail voltage in advance. By anticipating when high power will be needed and preparing the rail accordingly, the system avoids the need to maintain continuously high voltage, thereby preventing overheating while ensuring power availability when needed.
Solution Approach 2:
The system dynamically adjusts the DC rail voltage level based on real-time predictions of power requirements rather than maintaining a static high voltage level. This dynamic adaptation allows the rail to be optimized for each specific operational phase, improving efficiency and preventing thermal overload while maintaining the ability to support fast actuators when required.
2Reliability
If the DC section adjusts the rail voltage slowly to prevent overheating, then system reliability is improved, but the response time to meet power demands worsens
Solution Approach 1:
The predictive control system calculates and prepares rail voltage adjustments in advance based on the known pulsed waveform pattern. By anticipating future power demands and pre-adjusting the DC rail voltage accordingly, the system eliminates the need for rapid last-minute adjustments, allowing the slow DC section to respond effectively without compromising response time.
Solution Approach 2:
The system continuously monitors the actual power consumption and rail voltage levels, comparing them against the predicted values. This feedback mechanism allows the control system to refine its predictions and adjust the DC rail voltage optimally, ensuring that even slow-responding DC sections can meet power demands timely while maintaining reliability.
3Measurement precision
If fast actuators are controlled independently without coordination with slow actuators, then control precision for fast actuators is improved, but asynchronous operations cause inefficiency and overheating
Solution Approach 1:
The control system merges the control of fast and slow actuators into a unified predictive control framework. By coordinating their operations based on the overall pulsed waveform requirements, the system ensures that fast actuators receive precise control signals while the DC rail is simultaneously optimized to provide necessary power without excessive energy consumption or overheating.
Solution Approach 2:
The system implements coordinated feedback control where both fast and slow actuators are monitored and adjusted based on their interdependent performance. This coordinated feedback mechanism allows the system to maintain precise control of fast actuators while simultaneously optimizing the power delivery from the DC section, preventing energy waste and thermal issues caused by asynchronous operations.
Data Source
AI summary
This disclosure describes systems, methods, and apparatus for adjusting at least one actuator using at least one control output value to control a plasma processing system. More specifically, the controlling is based on receiving a reference signal defining target values for a parameter that is controlled at an output within the plasma processing system; obtaining a measure of the parameter, where the parameter is measured at a first sampling frequency; calculating one or more internal control signal values at a second sampling frequency; predicting, using an internal model, one or more internal measurements of the controlled parameter at the second sampling frequency; and adjusting, based upon the one or more control output values, at least one actuator at the first sampling frequency, where the control output values are based on the internal control signal values and the predicted internal measurements.