Pressure-Regulated Gas Flow Control Across a Wide Flow Range
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Solution Overview
Problem
Conventional mass flow controllers (MFCs) in electronic device manufacturing systems face limitations in accurately measuring and controlling gas flow rates across a wide range, leading to increased costs and potential gas decomposition or corrosion, especially at high or low flow rates.
Innovation Solution
A pressure-regulated mass flow control apparatus comprising a flow restriction element, a pressure regulator, and a flow meter, where the system controller adjusts pressure settings based on measured flow rates to achieve target flow rates without altering the gas temperature, using calibration data to map pressure settings to flow rates.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Quantity of substance
If a thermal-based MFC is used to measure high flow rates (up to 500 slms), then the measurement range is extended, but the gas temperature increase causes corrosion of components or decomposition of the gas
Solution Approach 1:
The patent removes the thermal heating elements from the flow measurement system, extracting the harmful temperature-increasing function while preserving the flow measurement capability through pressure-based measurement instead
Solution Approach 2:
The patent replaces the thermal-based measurement mechanism with a pressure-based measurement mechanism, substituting thermal energy with mechanical pressure control to achieve flow rate measurement without temperature increase
2Measurement precision
If a pressure-based MFC is used to maintain accurate measurement, then measurement precision is improved, but the downstream pressure must be maintained at approximately 400 torr or below, limiting application versatility
Solution Approach 1:
The patent implements a dynamic pressure regulation system that actively adjusts pressure settings based on desired flow rates, allowing the system to adapt to different pressure conditions while maintaining measurement accuracy across various applications
Solution Approach 2:
The patent changes the operating pressure parameter dynamically through the pressure regulator, allowing the system to operate at different pressure levels depending on the application requirements while maintaining accurate flow rate measurement
3Quantity of substance
If conventional MFCs are used to cover a wide range of flow rates, then measurement capability is improved, but the system complexity and cost increase
Solution Approach 1:
The patent merges the pressure regulation function and flow measurement function into a single integrated system, combining what would traditionally require separate components into one unified apparatus that controls both pressure and flow rate
Solution Approach 2:
The patent creates a universal flow control system that can handle a wide range of flow rates (0-500 slms) and pressure conditions using a single apparatus, eliminating the need for multiple specialized MFCs for different applications
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution enables precise control of gas flow rates from 0 to 500 slms, avoiding temperature-related issues and expanding the range of measurable flow rates, thus improving manufacturing process control and reducing costs by eliminating the need for temperature-based MFCs.
Implementation Method 1
a flow restriction element configured to restrict a flow rate of a gas
Implementation Method 2
a pressure regulator coupled to an inlet of the flow restriction element, where the pressure regulator is configured to control a pressure of the gas between the pressure regulator and the flow restriction element
Implementation Method 3
a flow meter coupled to an outlet of the flow restriction element. The flow meter is configured to measure the flow rate of the gas at an outlet of the flow restriction element
Data Source
AI summary
Disclosed herein is an apparatus for controlling a flow rate of a gas including a flow restriction element configured to restrict a flow rate of a gas; a pressure regulator coupled to an inlet of the flow restriction element, wherein the pressure regulator is configured to control a pressure of the gas between the pressure regulator and the flow restriction element; a flow meter coupled to an outlet of the flow restriction element, wherein the flow meter is configured to measure the flow rate of the gas at an outlet of the flow restriction element; and a controller operatively coupled to the pressure regulator and the flow meter, wherein the controller is to receive a measurement of the flow rate by the flow meter, determine a pressure setting associated with a target flow rate, and cause the pressure regulator to have the pressure setting.