Pressure Tank Liquid Circulation Evaporation Control
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Solution Overview
Problem
In the process of manufacturing semiconductor devices or liquid crystal displays, the continuous heating of chemical liquids in circulation lines leads to vaporization and evaporation, resulting in unnecessary consumption of liquids before they are supplied to the substrate, which is inefficient and wasteful.
Innovation Solution
An apparatus and method that include a pressure tank with a circulation line and a controlled heating system, where pressured gas is supplied to the tank to maintain pressure and prevent evaporation, and the exhaust line is managed to ensure liquid is only supplied to the substrate when needed, reducing vaporization and consumption.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Temperature
If chemical liquid is continuously heated in the circulation line to maintain temperature, then the liquid can be supplied at the required temperature to the substrate, but the liquid evaporates and is consumed unnecessarily before being supplied
Solution Approach 1:
The system divides the liquid storage and heating into separate functional zones: a pressure tank for storage, a circulation line with heating units for temperature maintenance, and a supply line for substrate processing. This segmentation allows the liquid to be heated only when needed for supply, rather than continuously heated in circulation, reducing unnecessary evaporation and consumption.
Solution Approach 2:
The system pre-heats the chemical liquid in the pressure tank before it is supplied to the substrate. By maintaining the liquid at the required temperature in advance within the sealed pressure tank, the system eliminates the need for continuous heating during circulation, thereby preventing evaporation losses while ensuring the liquid is ready for immediate use.
2Object-generated harmful factors
If the exhaust line is kept open to vent gas from the pressure tank, then gas can be exhausted, but liquid vaporization increases and consumption rises
Solution Approach 1:
The exhaust line is designed with dynamic control, allowing it to be opened or closed based on system requirements. During normal operation, the exhaust line remains closed to prevent vaporization. When gas accumulation becomes problematic, the system can temporarily open the exhaust line to vent gas, then close it again to prevent further vaporization. This dynamic control resolves the contradiction between gas exhaust and liquid conservation.
3Loss of substance
If pressure is increased in the pressure tank to prevent evaporation, then liquid consumption is reduced, but the system complexity increases due to pressure control mechanisms
Solution Approach 1:
The pressure tank is designed to automatically maintain internal pressure to prevent evaporation, using the natural pressure differential created by the sealed environment and liquid weight. The system self-regulates pressure without requiring complex external control mechanisms, thereby reducing liquid consumption while minimizing added system complexity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach effectively reduces liquid consumption by maintaining pressure in the tank and preventing evaporation during the standby state, ensuring that only the necessary amount of liquid is used during the processing of substrates.
Implementation Method 1
a circulation line including a first heating unit configured to heat liquid disposed therein
Implementation Method 2
a pressured gas supply line connected to the pressure tank and configured to supply pressured gas to the pressure tank in the liquid supply standby state and to pressurize gas
Implementation Method 3
an exhaust line connected to the pressure tank and configured to exhaust gas in the pressure tank
Implementation Method 4
liquid heated by the first heating unit circulates in the pressure tank in a liquid supply standby state
Data Source
AI summary
An apparatus for processing a substrate includes a liquid supply line; a pressure tank configured to store liquid; a circulation line including a first heating unit configured to heat liquid, wherein liquid heated by the first heating unit circulates in the pressure tank in a liquid supply standby state, which is before liquid is supplied to the substrate in a process chamber; a pressured gas supply line configured to supply pressured gas to the pressure tank in the liquid supply standby state and to pressurize gas; an exhaust line configured to exhaust gas in the pressure tank; and a control unit configured to control pressure in the pressure tank to increase to a predetermined pressure by opening the pressured gas supply line in a state in which the pressure tank is closed before liquid circulates in the pressure tank in the liquid supply standby state.