Pressurized Liquid Supply Pack for Bubble-Free Substrate Coating
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Solution Overview
Problem
Existing liquid supply units for substrates generate bubbles due to direct gas contact with liquids, leading to non-uniform film thickness and incomplete liquid consumption, and require replacement even when significant amounts remain, potentially degrading the stored liquid.
Innovation Solution
A liquid supply unit with a pressurizing mechanism using rollers to minimize gas contact, a gas supply unit to maintain liquid flow without bubbles, and a controller to manage liquid levels, ensuring efficient use and preventing storage assembly replacement.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If gas is supplied through a gas supply unit to a bottle where photoresist is stored, then the photoresist is delivered outside the bottle by gas pressure, but a large amount of bubbles are generated and the bubble-containing photoresist is supplied to the substrate, reducing the uniformity of the liquid thickness
Solution Approach 1:
The patent introduces an intermediary liquid delivery pipe that connects the inner pack to the external liquid supply system. This pipe acts as a mediator that allows liquid transfer without direct gas contact, thereby preventing bubble generation while maintaining supply efficiency. The pipe serves as a controlled interface between the pressurized liquid environment and the gas-driven delivery mechanism.
Solution Approach 2:
The patent extracts the gas supply function from direct contact with the photoresist. Instead of allowing gas to directly pressurize the liquid in the bottle, the system uses a mechanical pressurizing unit that applies pressure through the pack unit walls, separating the gas phase from the liquid phase and eliminating bubble formation while maintaining pressure-driven flow.
2Productivity
If photoresist is supplied by gas pressure, then the liquid can be delivered to the substrate, but the photoresist in the bottle cannot be completely consumed and the bottle is replaced
Solution Approach 1:
The patent implements a dynamic pressurizing mechanism with a pressurizing member that can move between a standby position and a pressurizing position. This dynamic system allows for controlled, incremental pressurization that can maintain liquid flow while extracting nearly all liquid from the pack unit, maximizing consumption and minimizing waste compared to static gas pressure systems.
Solution Approach 2:
The system incorporates a detector that monitors the amount of liquid remaining in the inner pack and provides feedback to the control unit. This feedback mechanism enables the system to adjust pressurization levels and timing, ensuring complete liquid extraction while preventing over-pressurization that could cause leakage or waste, thereby maximizing photoresist consumption efficiency.
3Ease of operation
If gas is supplied directly to the photoresist bottle, then liquid supply is achieved, but the storage assembly must be replaced even when significant amounts remain, potentially degrading the stored liquid
Solution Approach 1:
The patent segments the storage system into a removable pack unit containing the photoresist and a stationary container housing the pressurizing mechanism. This segmentation allows the pack unit to be easily replaced when depleted while leaving the expensive pressurizing infrastructure intact. The detector and control system manage multiple packs, ensuring continuous operation without degrading stored liquid through unnecessary replacements.
Solution Approach 2:
The system incorporates an automatic detection and control mechanism that monitors liquid levels and manages pressurization without manual intervention. The detector automatically identifies when the liquid supply is depleted and the control unit manages the replacement process, preventing premature replacement and ensuring liquid is only changed when necessary, thereby maintaining storage stability and reducing degradation risks.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution reduces bubble formation, ensures complete liquid consumption, and prevents liquid degradation, enhancing substrate processing efficiency and reducing waste.
Implementation Method 1
a pressurizing unit positioned outside the pack unit in the interior space and physically pressurizes the pack unit
Implementation Method 2
a gas supply unit for supplying gas into a space between the inner pack and the outer pack within the accommodation space
Data Source
AI summary
Disclosed is an apparatus for processing a substrate, the apparatus including: a processing unit for processing a substrate; and a liquid supply unit for supplying a liquid to the substrate disposed in the processing unit. The liquid supply unit includes: a storage assembly in which a liquid is stored; and a liquid supply pipe for supplying the liquid in the storage assembly to the processing unit, and the storage assembly includes: a container having an interior space; a pack unit that is placed in an interior space and includes an inner pack in which a liquid is stored; a liquid delivery pipe for supplying the liquid stored in the inner pack to the liquid supply pipe; and a pressurizing unit that is located outside the pack unit in the accommodation space and physically pressurizes the pack unit.