Pressurized Spray Deposition Device for Organic Film Resolution
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Solution Overview
Problem
Existing organic material steam deposition methods suffer from material waste, low deposition rate, and low resolution due to the use of masks and large evaporation chambers, which limit the efficiency and precision of organic film formation in photovoltaic devices.
Innovation Solution
A pressurized spray deposition device comprising a uniform-pressure mixing chamber, high-pressure carrier gas, piezoelectric pressurizing device, and nozzle, where the organic material steam is mixed with carrier gas and sprayed at high speed using a piezoelectric pressurizing device to form a collimated jet, eliminating the need for masks and enhancing deposition resolution.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a mask is provided between the sprinkler element and the deposition substrate, then the organic material deposition can be controlled, but serious waste of organic material occurs on the mask and resolution is reduced due to material spread
Solution Approach 1:
The patent removes the mask component from the deposition system entirely. Instead of using a mask to define patterns, the invention uses direct digital inkjet printing where digital information controls the deposition process, extracting the masking function and replacing it with digitally controlled material ejection.
Solution Approach 2:
The patent replaces the mechanical mask system with a digital control system. The sprinkler element is replaced with a digital inkjet printing head that can be precisely controlled by digital signals to deposit material only where needed, substituting mechanical masking with electronic control.
2Loss of substance
If the distance between the substrate and the evaporation source is increased to avoid mask waste, then material waste is reduced, but the organic material spreads during deposition resulting in lower resolution
Solution Approach 1:
The patent uses a carrier gas flow system to transport the organic material vapor from the evaporation source to the substrate. The carrier gas creates a controlled flow that directs the material precisely, preventing both waste and spread, and enabling resolution improvement without increasing distance.
Solution Approach 2:
The patent changes the physical parameters of the deposition process by introducing a carrier gas flow field. This creates a controlled environment where material transport is governed by gas flow dynamics rather than simple diffusion, allowing precise control over deposition patterns.
3Productivity
If the evaporation chamber is made large to accommodate the deposition process, then the deposition rate is reduced and organic material steam spreads easily, but the resolution of the organic film is compromised
Solution Approach 1:
The patent segments the deposition process into distinct zones: an evaporation zone where material is vaporized, a transport zone where carrier gas carries the vapor, and a deposition zone where material is deposited on the substrate. This segmentation allows each zone to be optimized independently for its specific function.
Solution Approach 2:
The patent introduces carrier gas as an intermediary medium between the evaporation source and the substrate. This intermediary transports the organic material vapor in a controlled manner, preventing uncontrolled spread while maintaining high deposition rates and resolution.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution achieves high-resolution organic film deposition with reduced material waste and increased deposition rate by selectively absorbing organic material molecules onto the substrate, avoiding the limitations of traditional methods.
Implementation Method 1
a piezoelectric pressurizing device, the organic material steam source and the high-pressure carrier gas feeding device are respectively connected with the uniform-pressure mixing chamber, and an outlet of the uniform-pressure mixing chamber is connected with the nozzle through the piezoelectric pressurizing device
Implementation Method 2
the organic material steam is mixed with carrier gas and sprayed at high speed using a piezoelectric pressurizing device to form a collimated jet
Implementation Method 3
sprayed at high speed using a piezoelectric pressurizing device to form a collimated jet, eliminating the need for masks and enhancing deposition resolution
Data Source
AI summary
The invention relates to the technical field of display, particularly a pressurized spray deposition device and method for an organic material steam. The pressurized spray deposition device comprises an uniform-pressure mixing chamber, an organic material steam source, a high-pressure carrier gas feeding device, a piezoelectric pressurizing device and a nozzle, wherein the organic material steam source and the high-pressure carrier gas feeding device are respectively connected with the uniform-pressure mixing chamber, and an outlet of the uniform-pressure mixing chamber is connected with the nozzle through the piezoelectric pressurizing device. The organic material steam in the organic material steam source enters the uniform-pressure mixing chamber and is mixed with the introduced carrier gas to form a carried gas mixture. Under the action of the piezoelectric pressurizing device, the carried gas mixture is sprayed at a high speed from the nozzle via the piezoelectric pressurizing device to form a highly collimated jet. The jet impacts the deposition substrate, so that the deposition substrate selectively physically absorbs the organic material molecules, and the carrier gas escapes, forming an organic film with higher resolution, while avoiding the problem of waste of organic materials caused by the mask.