Printed Metal Nanoparticle Masks for Semiconductor Patterning
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Solution Overview
Problem
Current methods for forming contacts and semiconductor devices are expensive due to the extensive use of photomasks, particularly in photolithographic processes, which complicate the fabrication of layered electronic structures and increase circuit costs.
Innovation Solution
A method involving the formation of a dielectric layer with metal nanoparticles printed as a mask, exposed to actinic radiation to create vias in the dielectric, allowing for the formation of interconnects between semiconductor devices without the need for traditional photomasking, using jet printing techniques to deposit and pattern metal nanoparticles.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If traditional photomasking is used for forming contacts and semiconductor devices, then alignment and patterning can be achieved, but fabrication costs increase significantly
Solution Approach 1:
The patent replaces expensive, reusable photomasks with disposable printed metal nanoparticle masks. These masks are deposited directly onto the substrate using inkjet printing, eliminating the need for costly photomask fabrication and alignment equipment. The masks are single-use and remain on the substrate throughout the process, serving both as alignment references and functional elements.
Solution Approach 2:
The printed metal nanoparticle masks serve multiple functions: they provide alignment references for subsequent lithography steps, act as functional contacts or interconnect elements, and eliminate the need for separate photomask alignment procedures. This multi-functionality consolidates multiple process steps into one, reducing overall fabrication complexity and cost.
2Ease of manufacture
If photomasks are extensively used in photolithographic processes, then semiconductor devices can be formed, but circuit costs substantially increase
Solution Approach 1:
The patent merges the alignment reference function and the functional contact/interconnect function into a single printed metal nanoparticle structure. This eliminates the need for separate photomask alignment procedures and reduces the number of fabrication steps, thereby simplifying the overall fabrication procedure while maintaining device formation capability.
3Ease of operation
If phase change materials are used as masks, then jet printing can be utilized, but thick layers are needed to block radiation and the material must be removed by etching
Solution Approach 1:
The patent changes the material parameter from phase change material to metal nanoparticles, which have superior radiation blocking properties. This allows the use of much thinner mask layers (single-digit nanometer thickness) compared to phase change materials, while maintaining effective radiation blocking. The metal nanoparticles also eliminate the need for subsequent removal steps.
Solution Approach 2:
The metal nanoparticle masks are deposited as thin, disposable layers that remain on the substrate and serve as permanent functional elements. This eliminates the need for complex removal processes required by phase change materials, simplifying the fabrication procedure.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach reduces fabrication costs by eliminating the need for expensive photomasks and enables the creation of complex semiconductor structures with improved alignment and patterning capabilities, particularly on non-planar surfaces, while using the same printing equipment for both masking and metal deposition.
Implementation Method 1
The mask pattern is exposed to actinic radiation such that regions which are not masked by the mask pattern of metal nanoparticles undergo a chemical change
Implementation Method 2
The mask pattern is exposed to actinic radiation such that regions which are not masked by the mask pattern of metal nanoparticles undergo a chemical change
Data Source
AI summary
A method of forming vias and pillars using printed masks is described. The printed masks are typically made from droplets that include suspended metal nanoparticles. The use of the same metal nanoparticle solution in both the mask formation and the subsequent formation of conducting structures simplifies the fabrication process.