Semiconductor Probe Evaluation Apparatus Partial Discharge Prevention
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Solution Overview
Problem
Existing evaluation apparatuses for semiconductor devices with vertical structures face challenges in preventing partial discharge during electrical characteristic evaluation, which can lead to malfunction and are not effectively addressed by existing techniques that rely on sealed or non-sealed pressure vessels, as foreign substances on the devices can create discharge paths.
Innovation Solution
An evaluation apparatus with a stage and an upper component that can come into proximity and separate, featuring probes on the undersurface of the upper component, a sidewall part enclosing the probe, and gas supplying parts to increase pressure in the measurement space, preventing partial discharge by removing foreign substances before evaluation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If pressure is applied to prevent partial discharge using sealed pressure vessel or non-sealing pressure application, then partial discharge prevention is improved, but foreign substances on the device can create discharge paths reducing effectiveness
Solution Approach 1:
The gas supply unit supplies gas to blow away foreign substances from the semiconductor device and probe contact areas before the evaluation process begins. This preliminary cleaning action removes potential discharge paths created by foreign substances, ensuring that subsequent pressure application during evaluation is effective in preventing partial discharge.
Solution Approach 2:
The invention uses gas (pneumatic) flow from the gas supply unit to remove foreign substances from the measurement area. The gas flow creates a clean environment by blowing away contaminants that could otherwise create discharge paths, complementing the pressure application method for partial discharge prevention.
2Adaptability or versatility
If the number of pins is increased to meet high current and high voltage application demands, then electrical characteristic evaluation capability is improved, but the complexity of the evaluation apparatus increases
Solution Approach 1:
The chuck stage with its electrode acts as an intermediary that provides a common reference potential for multiple probes. By using the chuck stage electrode as a shared reference, the apparatus can evaluate multiple high-current pins simultaneously without requiring each pin to have separate reference connections, thus reducing overall system complexity while maintaining high current evaluation capability.
3Ease of operation
If vacuum suction is used to fix the installation surface of the semiconductor device to the chuck stage, then device fixation is improved, but the risk of partial discharge between probes and chuck stage increases
Solution Approach 1:
The chuck stage is equipped with an electrode that can be set to the same potential as the probe tips. By making the chuck stage and probes equipotential, the voltage difference that would cause partial discharge is eliminated. This allows vacuum suction fixation to be used without increasing partial discharge risk, as there is no potential difference between the fixed device and the probing elements.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus effectively prevents partial discharge by increasing pressure in the measurement space and removing foreign substances from the semiconductor device and probes, ensuring reliable evaluation without malfunctions.
Implementation Method 1
an evaluator that evaluates the electrical characteristics of the to-be-measured object connected to the probe, with a pressure increased in the space through supplying the gas from the first gas supplying part
Implementation Method 2
the evaluation apparatuses bring, for example, by vacuum suction, an installation surface of the to-be-measured object in contact with a placed surface of a chuck stage to fix the installation surface
Data Source
AI summary
Provided is a technique capable of preventing occurrence of partial discharge. An evaluation apparatus includes a probe disposed on an undersurface of an upper component; a sidewall part disposed on the undersurface of the upper component and enclosing sides of the probe; and a first gas supplying part. The first gas supplying part is capable of supplying a gas to a to-be-measured object that is placed on a stage when the sidewall part comes in proximity to the stage, and to a space enclosed by the stage, the sidewall part, and the upper component when the sidewall part is in contact with the stage.


