Integrated Probe Feeder Rod for RF Power Measurement
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Solution Overview
Problem
Current plasma processing apparatuses face challenges in accurately measuring electrical characteristics of radio-frequency power due to probe mounting errors and power loss, leading to inconsistent plasma parameter adjustments and instability in plasma generation.
Innovation Solution
A plasma processing apparatus with a probing feeder rod that integrates a probe as part of the feeder rod, allowing for detachable mounting between the matcher and processing chamber, reducing power loss and enabling calibration in the operational state, thus ensuring accurate measurement and stable plasma generation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If a separate probe unit is mounted in the radio-frequency transmission path, then electrical characteristics can be measured, but power loss increases and measurement precision decreases due to mounting errors
Solution Approach 1:
The patent combines the probe unit with the feeder rod to form an integrated probing feeder rod. The probe is built into the feeder rod structure, eliminating the need for separate mounting of the probe unit in the radio-frequency transmission path. This integration reduces power loss by removing additional connection points and improves measurement precision by eliminating mounting errors associated with separate probe units.
2Ease of operation
If a separate probe unit is mounted between matcher and processing chamber, then plasma parameters can be adjusted, but device complexity increases due to additional mounting and calibration requirements
Solution Approach 1:
The probe unit is merged with the feeder rod to create an integrated probing feeder rod. This combination simplifies the overall system by reducing the number of separate components and their associated mounting and calibration procedures. The integrated design maintains ease of operation for plasma parameter adjustment while reducing device complexity.
Solution Approach 2:
The probing feeder rod is designed to be detachably mounted, allowing for dynamic configuration. The entire probing feeder rod can be removed as a single unit for calibration or replacement, simplifying maintenance operations compared to dealing with separate probe units and their mounting hardware.
3Ease of manufacture
If probe is mounted separately from feeder rod, then ease of manufacture is improved, but measurement precision deteriorates due to mounting errors
Solution Approach 1:
The probe and feeder rod are manufactured as an integrated unit. This merging of components ensures precise alignment and positioning of the probe relative to the radio-frequency transmission path, eliminating mounting errors that would occur with separate components. The integrated manufacturing process maintains ease of production while significantly improving measurement precision.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The integrated probe feeder rod system minimizes power loss and calibration errors, allowing for precise measurement of radio-frequency power characteristics, leading to improved stability and consistency in plasma generation.
Implementation Method 1
a probe used in electrical characteristics measurement and provided as an integrated part of a feeder rod
Implementation Method 2
a matcher that includes a matching circuit disposed between the electrode and the RF generator and set away from the processing chamber, which matches an input impedance at the electrode with an output impedance at the RF generator
Implementation Method 3
an RF generator that generates radio-frequency power to be supplied to the electrode
Implementation Method 4
Plasma is generated from the processing gas via the radio-frequency electrical field
Data Source
AI summary
A feeder rod that transmits radio-frequency power via a matcher to a susceptor used in plasma generation that is disposed inside a processing chamber where a wafer undergoes a predetermined type of plasma processing, includes as an integrated part thereof electrical characteristics measurement probes. The integrated feeder rod unit can be detachably installed as a whole between the matcher and the processing chamber.