Vertical Probe Head Shifted Guide Holes Eliminate Scrub

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

Vertical probe heads exert significant shear forces on semiconductor wafers during testing, causing unwanted lateral shifts due to the simultaneous scrub mechanism of contact probes, which can damage the wafer and affect the accuracy of the test.

Innovation Solution

The probe head is designed with guides having shifted guide holes to cancel out scrub movement, with a further lower guide absorbing the shear forces, ensuring each contact probe exerts no force on the wafer, thereby eliminating shear forces and maintaining probe bending functionality.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of manufacture

If the probe head uses a conventional guide configuration with parallel guides, then the structure is simple and easy to manufacture, but significant shear forces are exerted on the wafer causing lateral shifts during testing

Engineering Contradiction:
Improveguide configurationVSAvoidshear force on wafer
Core Design Contradiction:
Ease of manufactureVSObject-affected harmful factors

Solution Approach 1:

The single guide structure is segmented into multiple guides (first guide, second guide, third guide) with progressively shifted guide holes. This segmentation allows the shear force to be distributed and neutralized across multiple components rather than concentrated in a single guide, eliminating lateral forces on the wafer while maintaining manufacturing feasibility.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The guide holes are shifted not only in the horizontal direction but also arranged at different vertical levels (first guide at upper level, second guide at intermediate level, third guide at lower level). This three-dimensional arrangement creates a more complex force distribution that effectively neutralizes shear forces while allowing probe bending to occur in the vertical air gap.

Inventive Principle:
Principle #17Another dimension (Dimensionality change)

2Reliability

If the contact probes are allowed to bend freely in a large air gap, then proper contact with contact pads is achieved, but lateral scrub movement causes unwanted shear forces on the wafer

Engineering Contradiction:
Improvecontact reliabilityVSAvoidlateral scrub force
Core Design Contradiction:
ReliabilityVSObject-affected harmful factors

Solution Approach 1:

Different guides provide different local constraints: the first guide allows initial probe positioning, the second guide provides intermediate constraint with horizontal shift, and the third guide provides final constraint with additional horizontal shift. Each guide's guide holes are strategically positioned to provide the specific local constraint needed at that stage, collectively eliminating lateral scrub while maintaining vertical bending freedom.

Inventive Principle:
Principle #3Local quality

3Object-affected harmful factors

If multiple guides with shifted holes are used to eliminate shear forces, then wafer stability is improved, but the device complexity increases

Engineering Contradiction:
Improvewafer lateral shiftVSAvoidprobe head structure
Core Design Contradiction:
Object-affected harmful factorsVSDevice complexity

Solution Approach 1:

Multiple guide functions (support, alignment, shear force neutralization, probe constraint) are merged into a single integrated guide assembly consisting of three guides. Rather than using separate components for each function, the shifted guide holes in the three guides collectively perform all necessary functions, simplifying the overall structure while achieving the goal of eliminating lateral forces.

Inventive Principle:
Principle #5Merging (Combining)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This configuration eliminates shear forces on the wafer, preventing lateral shifts and ensuring precise and reliable testing without damaging the probes or contact pads, while allowing for proper bending and contact with the device under test.

Implementation Method 1

the contact probes undergo, during said pressing contact, a bending inside the air gap between the guides

Methodology Applied
Scientific EffectElastic deformation: Elasticity

Implementation Method 2

said probes being usually made of wires of special alloys with good electric and mechanical properties... slidingly housed in said guide holes

Methodology Applied
Scientific EffectFriction: Friction

Data Source

PatentEP3903111B1Vertical probe head having an improved contact with a device under test
Publication Date: 2024.08.07 TECHNOPROBE
  • EP3903111B1 patent drawingFigure 1
  • EP3903111B1 patent drawingFigure 2
  • EP3903111B1 patent drawingFigure 3

AI summary

A probe head (20) for testing a device under test integrated on a semiconductor wafer (26) comprises a plurality of contact probes (21), each provided with a first end (21a) and a second end (21b), said first end (21a) being adapted to contact pads (25) of the device under test, and at least one first lower guide (22) and one second lower guide (23) at the first end (21a), said guides (22, 23) being parallel to each other and provided with a respective plurality of first and second guide holes (22h, 23h) for slidingly housing the contact probes (21), wherein the second guide holes (23h) of the second lower guide (23) are shifted with respect to the first guide holes (22h) of the first lower guide (22) along a first direction (Dir1). Suitably, the probe head (20) comprises at least one third lower guide (24), which is substantially parallel to the first lower guide (22) and to the second lower guide (23) and is provided with a plurality of third guide holes (24h) for slidingly housing the contact probes (21), wherein the second lower guide (23) is arranged between the first lower guide (22) and the third lower guide (24), and wherein the third guide holes (24h) of the third lower guide (24) are shifted with respect to the second guide holes (23h) of the second lower guide (23) along a second direction (Dir2) opposite the first direction (Dir1), the shift of the third guide holes (24h) being such as to eliminate a scrub movement of the first ends (21a) of each contact probe (21) of the probe head (20).