Process Chamber Gas Control via Multi-Sensor Merging

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Solution Overview

Problem

Sensors within process chambers for measuring gas parameters in vacuum layer deposition processes are prone to contamination and drift, leading to inaccurate control of gas flow, which affects the precision of reactive sputtering processes.

Innovation Solution

A method and apparatus that utilize two or more sensors to measure gas parameters, determine a combined average parameter, and control the gas supply based on this average, allowing for precise control of gas flow by canceling out contamination effects and drift, even when sensors become contaminated.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If a single sensor is used to measure gas parameters in the process chamber, then the device complexity is low, but the measurement precision deteriorates over time due to contamination and drift

Engineering Contradiction:

Improvegas parameter measurement accuracyVSAvoidsensor system complexity

Core Design Contradiction:

Measurement precisionVSDevice complexity

Solution Approach 1:

The patent combines multiple sensors (at least two) to measure the same gas parameter simultaneously. By merging their readings and determining a combined average value, the system achieves higher measurement precision and reliability while compensating for individual sensor drift and contamination effects over time.

Inventive Principle:

Principle #5Merging (Combining)

2Reliability

If sensors are continuously used in the process chamber, then the gas supply control remains automated, but the reliability of sensor readings deteriorates due to contamination and drift

Engineering Contradiction:

Improvesensor reading accuracyVSAvoidsensor contamination

Core Design Contradiction:

ReliabilityVSObject-affected harmful factors

Solution Approach 1:

The system continuously monitors gas parameters using multiple sensors and feeds back the combined average value to the gas supply controller. This feedback mechanism allows for real-time adjustments while the redundancy of multiple sensors provides mutual validation, reducing the impact of contamination and drift on overall system reliability.

Inventive Principle:

Principle #23Feedback

Solution Approach 2:

By having multiple sensors in place before contamination occurs, the system prepares a backup measurement capability. When one sensor degrades, the other sensors continue to provide accurate readings, cushioning against the harmful effects of contamination and drift before they compromise the entire measurement system.

Inventive Principle:

Principle #11Beforehand cushioning (Prior cushioning)

3Measurement precision

If multiple sensors are used to measure gas parameters, then the measurement precision is maintained despite contamination, but the device complexity increases

Engineering Contradiction:

Improvegas parameter measurement accuracyVSAvoidsensor system complexity

Core Design Contradiction:

Measurement precisionVSDevice complexity

Solution Approach 1:

Inventive Principle:

Principle #5Merging (Combining)

Data Source

PatentEP3050073B1Method for controlling a gas supply to a process chamber, controller for controlling a gas supply to a process chamber, and apparatus thereof

Publication Date: 2019.11.06 APPLIED MATERIALS INC

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AI summary

A method (200) for controlling a gas supply to a process chamber (301) is provided. The method (200) includes: measuring (210) a gas parameter by each of two or more sensors (35, 36, 313, 314) provided in the process chamber (301); determining (220) a combined gas parameter from the measured gas parameters; and controlling (230) the gas supply to the process chamber (301) based on the determined combined gas parameter.