Process Chamber Gas Inlet Assembly for Uniform Gas Mixing
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Solution Overview
Problem
Existing gas inlet devices for semiconductor processing fail to adequately mix process gas components, leading to uneven distribution and turbulent flow fields with dead zones and vortices, which affect process uniformity and stability.
Innovation Solution
A gas inlet assembly with sequential mixing chambers, grooves, and jet plates that facilitate uniform gas mixing and diffusion, ensuring the gas outlet direction aligns with the inlet direction to minimize speed differences and prevent turbulent regions.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a shower head type gas inlet assembly is used, then gas distribution uniformity is improved, but particle generation increases due to liquid residual accumulation
Solution Approach 1:
The patent extracts and removes the liquid residual accumulation problem by designing a gas inlet assembly that prevents liquid from entering the gas distribution region in the first place. The liquid-proof structure separates liquid and gas flow paths, extracting the harmful liquid accumulation from the gas distribution system.
Solution Approach 2:
The patent introduces a liquid-proof structure as an intermediary element between the liquid supply system and the gas distribution system. This intermediary prevents liquid from contaminating the gas distribution region while allowing gas to flow freely, thus eliminating particle generation caused by liquid residuals.
2Manufacturing precision
If shower head type gas inlet assembly is used, then gas distribution uniformity is improved, but structure complexity increases
Solution Approach 1:
The patent merges the liquid-proof function with the gas distribution structure by integrating the liquid-proof structure into the gas inlet assembly. This combination achieves both liquid protection and gas distribution uniformity without requiring separate complex systems, thereby reducing overall structural complexity.
Solution Approach 2:
The gas inlet assembly is designed with multi-functionality, serving both as a liquid-proof barrier and as a gas distribution device. The shower head structure simultaneously prevents liquid entry and distributes gas uniformly, eliminating the need for separate components and reducing structural complexity.
3Device complexity
If conventional gas inlet assembly is used, then structure is simple, but gas distribution uniformity deteriorates
Solution Approach 1:
The patent segments the gas distribution function into multiple gas inlet holes arranged in a shower head pattern. This segmentation allows gas to be distributed through multiple small openings, creating uniform gas flow across the substrate surface while maintaining a relatively simple overall structure.
Solution Approach 2:
The patent applies local quality by configuring gas inlet holes with specific arrangements and dimensions at different locations to optimize gas distribution. The shower head structure provides localized gas injection points that ensure uniform gas distribution across the entire processing area.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution enhances gas component uniformity and stability by ensuring thorough mixing and uniform gas flow, reducing dead zones and vortices, thereby improving process stability and efficiency.
Implementation Method 1
a front surface of the process chamber is provided with a plurality of gas inlet holes
Implementation Method 2
a liquid-proof structure for preventing liquid from a liquid supply assembly from reaching a gas inlet assembly
Data Source
Figure 1~2
Figure 3A
Figure 3B
AI summary
A gas inlet assembly of a process chamber of a semiconductor process apparatus, a gas inlet device, and a semiconductor processing apparatus are provided. The gas inlet assembly is configured to transport the process gas to the gas inlet pipeline that communicates with the process chamber. The gas inlet assembly includes a plurality of mixing chambers arranged sequentially along the gas inlet direction. Any two neighboring mixing chambers communicate with each other. The gas inlet assembly includes a gas inlet connector. The gas inlet connector communicates with the mixing chamber at the most upstream in the gas inlet direction. The mixing chamber at the most downstream in the gas inlet direction communicates with the gas inlet pipeline. The gas outlet direction of the gas inlet assembly is the same as the gas inlet direction. The gas inlet assembly, the gas inlet device, and the semiconductor processing apparatus are configured to sufficiently mix and homogenize the process gas. Thus, the distribution uniformity of the components of the process gas can be improved, and the differences in the gas flow speeds between different areas of the gas inlet pipeline can be reduced. Thus, the process stability can be improved.