Process Chamber Parameter Control Using In-Situ Metrology Feedback
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing manufacturing systems lack the ability to generate correction data during the manufacturing process, leading to inferior or unusable products due to deviations in process chamber parameters, which are not effectively monitored by individual sensors.
Innovation Solution
Implementing in-situ metrology equipment within the process chamber to generate metrology data, which is used to create correction profiles that adjust process chamber parameters based on actual thickness profiles, applying machine-learning models to predict and correct deviations in real-time.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If individual sensors are used to monitor manufacturing parameters, then the monitoring function is simple and device complexity is low, but manufacturing precision deteriorates because correction data cannot be generated during the manufacturing process
Solution Approach 1:
The patent combines multiple sensors and metrology equipment into an integrated monitoring system that collects data from various sources (individual sensors, spectroscopic sensors, interferometric sensors) and processes them together to generate comprehensive correction data, resolving the contradiction by merging simple monitoring components into a sophisticated quality control system
Solution Approach 2:
The patent introduces an intermediary processing system that receives data from simple sensors and metrology equipment, analyzes the combined information, and generates correction data that is then applied to adjust manufacturing parameters, acting as a mediator between simple monitoring and complex quality control requirements
2Productivity
If process parameters are not adjusted in real-time, then device complexity remains low, but loss of time increases due to inferior or unusable products requiring rework or scrapping
Solution Approach 1:
The patent implements a feedback mechanism where metrology equipment continuously monitors manufacturing parameters during the process, compares actual values against target values, and automatically generates and applies correction data to adjust parameters in real-time, creating a closed-loop control system that improves productivity through continuous optimization
Solution Approach 2:
The system performs self-correction by automatically generating correction data from its own monitoring measurements and applying these corrections to adjust manufacturing parameters without external intervention, enabling the system to self-optimize and maintain high productivity
3Manufacturing precision
If metrology equipment is added to generate correction data, then manufacturing precision improves, but device complexity and cost increase
Solution Approach 1:
The patent designs the metrology equipment and processing system to perform multiple functions: monitoring manufacturing parameters, generating correction data, and providing quality assurance, thereby justifying the added complexity through multi-functionality that delivers comprehensive process control
Data Source
AI summary
An electronic device manufacturing system capable of performing a first substrate manufacturing process on a substrate according to a plurality of steps of a process recipe and obtaining a respective set of metrology data for each corresponding step of the plurality of steps. A correction profile is generated based on the set of metrology data and an updated process recipe is generated by applying the correction profile to the process recipe to adjust one or more setting parameters of the plurality of setting parameters. A second substrate manufacturing process is performed on the substrate according to the updated process recipe.