Process Chamber Recoating for Consistent Molybdenum Film Deposition
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing film-forming apparatuses face challenges in maintaining consistent film properties between initial and subsequent film formations due to residual molybdenum deposits, leading to variations in film thickness and quality.
Innovation Solution
A cleaning method involving the use of a fluorine gas to remove molybdenum deposits, followed by coating the chamber with a molybdenum nitride film and then a molybdenum film through atomic layer deposition or chemical vapor deposition, ensuring uniform film formation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If the process chamber is cleaned by removing molybdenum film deposits, then the film-forming apparatus can be reused, but residual deposits remain that cause variations in film properties during subsequent film formations
Solution Approach 1:
The patent converts the harmful residual molybdenum deposits into a beneficial intermediate layer by performing a nitridation treatment that transforms them into molybdenum nitride. This intermediate layer then serves as a uniform foundation for subsequent molybdenum film deposition, ensuring consistent film properties across multiple production runs while maintaining apparatus reusability.
Solution Approach 2:
The patent applies a preliminary nitridation treatment to the process chamber interior before performing the actual molybdenum film formation. This preliminary action of converting residual deposits into molybdenum nitride prepares a uniform surface that eliminates variability in subsequent film deposits, ensuring manufacturing precision from the first film formation after cleaning.
2Device complexity
If the process chamber is coated with a molybdenum film directly after cleaning, then the film formation process is simple, but the initial film properties differ from subsequent films due to surface variations
Solution Approach 1:
The patent introduces a nitridation step that converts the problematic residual deposits into a beneficial molybdenum nitride intermediate layer. This additional step, while increasing process complexity, ensures uniform film composition by providing a consistent surface chemistry for subsequent molybdenum deposition, eliminating the instability in film properties.
Solution Approach 2:
The patent creates a composite structure consisting of a molybdenum nitride intermediate layer combined with the molybdenum film layer. This composite approach ensures uniform film composition by combining the nitrided surface (which provides chemical uniformity) with the molybdenum film (which provides the desired functional properties).
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method reduces variations in film properties by uniformly coating the chamber, thereby maintaining consistent film thickness and quality across multiple film formations.
Implementation Method 1
supplying a cleaning gas into the process chamber, thereby removing the molybdenum film deposited in an interior of the process chamber
Implementation Method 2
coating the interior of the process chamber with a molybdenum nitride film
Implementation Method 3
coating the interior of the process chamber with the molybdenum film
Data Source
AI summary
A cleaning method is for a film-forming apparatus configured to form a molybdenum film over a plurality of substrates housed in a process chamber. The cleaning method includes (a) supplying a cleaning gas into the process chamber, thereby removing the molybdenum film deposited in an interior of the process chamber; (b) after (a), coating the interior of the process chamber with a molybdenum nitride film; and (c) after (b), coating the interior of the process chamber with the molybdenum film.


