Process Chamber Sealing for In-Situ Plasma Density Measurement

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Solution Overview

Problem

In semiconductor manufacturing, maintaining a vacuum state within a process chamber during plasma density measurement is challenging, leading to decreased productivity due to the need for separate processes to restore the vacuum state after introducing a plasma density measurement probe.

Innovation Solution

A process chamber with a first opening/closing device and a second opening/closing device, along with a seal structure, is designed to maintain the vacuum state by controlling the introduction and movement of the plasma density measurement probe through the chamber.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Measurement precision

If a plasma density measurement probe is introduced into the process chamber to measure plasma density, then plasma density measurement capability is improved, but the vacuum state of the process chamber deteriorates

Engineering Contradiction:

Improveplasma density measurement capabilityVSAvoidvacuum state

Core Design Contradiction:

Measurement precisionVSReliability

Solution Approach 1:

The opening/closing device is divided into multiple blades that can move independently to create openings of different sizes. This segmentation allows the system to maintain vacuum by closing blades when not measuring, while enabling probe introduction when measurement is needed, thus resolving the contradiction between measurement capability and vacuum maintenance.

Inventive Principle:

Principle #1Segmentation

Solution Approach 2:

The opening/closing device uses movable blades that can dynamically adjust the opening size and state based on operational requirements. The blades transition between open and closed positions to accommodate both vacuum maintenance and probe introduction needs, making the system adaptive to different operational states.

Inventive Principle:

Principle #15Dynamics

2Measurement precision

If the opening/closing device allows probe introduction, then measurement capability is improved, but device complexity increases

Engineering Contradiction:

Improveprobe introduction capabilityVSAvoidopening/closing device structure

Core Design Contradiction:

Measurement precisionVSDevice complexity

Solution Approach 1:

The measurement function is extracted as a separate, temporary operation. The opening/closing device enables probe introduction only when needed for measurement, then closes to restore vacuum. This extraction allows measurement capability without permanently complicating the chamber structure.

Inventive Principle:

Principle #2Taking out (Extraction)

Solution Approach 2:

The opening/closing device uses thin, movable blades that can flexibly open and close. These thin-film-like structures provide the necessary opening capability while maintaining a compact, low-complexity design when closed, minimizing the impact on overall device complexity.

Inventive Principle:

Principle #30Flexible shells and thin films

Data Source

PatentUS20240162014A1Process chamber, substrate treating apparatus including the same, and operating method of the substrate treating apparatus

Publication Date: 2024.05.16 SAMSUNG ELECTRONICS CO LTD

AI summary

A process chamber includes a housing providing a process space where plasma processing is performed, a first opening/closing device in a side wall of the housing, the first opening/closing device including a first frame and at least one opening/closing blade connected to the first frame, and a second opening/closing device on an outside of the side wall of the housing and on a same line as the first opening/closing device, the second opening/closing device including a second frame and an opening/closing door structure connected to the second frame, wherein the first opening/closing device and the second opening/closing device are configured to maintain a vacuum state of the process space.