Process Control Chamber for Precise Vaporized Reactant Delivery

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Solution Overview

Problem

Existing semiconductor processing systems face challenges in controlling the delivery of vaporized reactants due to small process windows between vaporization and decomposition temperatures, low vapor pressure, and the need for uniform dosage, leading to difficulties in monitoring and controlling the concentration and dosage of reactants in reaction chambers.

Innovation Solution

A reactor system with a process control chamber positioned between the source vessel and the reaction chamber, equipped with a pressure transducer, injection gas source, and control system, which collects and transfers a measured amount of vaporized reactant at a predetermined pressure, using an injection gas to modify chamber pressure and ensure accurate delivery to the reaction chamber.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If reactant vapors are generated by heating solid or liquid sources, then vaporized reactant can be supplied to the reaction chamber, but control over vapor phase delivery is difficult due to small process windows between vaporization and decomposition temperatures

Engineering Contradiction:

Improvecontrol over vapor phase deliveryVSAvoidprocess window between vaporization and decomposition temperatures

Core Design Contradiction:

Manufacturing precisionVSTemperature

Solution Approach 1:

The system divides the vapor delivery function into separate components: a source region for vapor generation, a transport region with controlled pressure gradient, and a delivery region to the reaction chamber. This segmentation allows independent optimization of vaporization conditions and delivery control, resolving the contradiction between achieving vaporization and maintaining precise delivery control within narrow temperature windows.

Inventive Principle:

Principle #1Segmentation

Solution Approach 2:

A carrier gas is introduced as an intermediary substance to transport the vaporized reactant from the source to the reaction chamber. The carrier gas enables controlled delivery by establishing pressure gradients and flow patterns that are independent of the narrow temperature process window, allowing precise vapor phase delivery control without being constrained by the small temperature margin between vaporization and decomposition.

Inventive Principle:

Principle #24Intermediary (Mediator)

2Quantity of substance

If heating is applied to solid or liquid source chemicals, then vaporized reactant is produced, but vapor pressure is low making delivery control difficult

Engineering Contradiction:

Improvevapor pressureVSAvoiddelivery control

Core Design Contradiction:

Quantity of substanceVSManufacturing precision

Solution Approach 1:

The system employs pneumatic principles by using controlled pressure gradients established through carrier gas flow to transport the vaporized reactant. Instead of relying solely on low vapor pressure for delivery, the invention uses external pressure control mechanisms that are independent of the source material's vapor pressure, thereby enabling precise delivery control even when vapor pressure is low.

Inventive Principle:

Principle #29Pneumatics and hydraulics

3Manufacturing precision

If continuous streams of reactant vapor are supplied to achieve uniform dosage, then deposition quality improves, but monitoring and controlling concentration becomes difficult

Engineering Contradiction:

Improveuniform dosageVSAvoidconcentration monitoring

Core Design Contradiction:

Manufacturing precisionVSMeasurement precision

Solution Approach 1:

The system incorporates feedback mechanisms through flow sensors and pressure monitoring that continuously measure carrier gas flow rate and pressure conditions. Since the carrier gas flow directly controls vapor transport and dosage, the feedback system can monitor and adjust delivery parameters in real-time, enabling both uniform dosage and precise concentration control through closed-loop regulation of the carrier gas system.

Inventive Principle:

Principle #23Feedback

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The system provides precise control over the amount and pressure of vaporized reactants delivered to the reaction chamber, enhancing process control and quality of chemical deposition processes.

Implementation Method 1

These solid or liquid sources may be heated to produce a vaporized reactant for a reaction process

Methodology Applied

Scientific EffectVaporization: Evaporation

Implementation Method 2

the injection gas can be supplied to the process control chamber to provide a known amount of vaporized reactant at a desired pressure within the process control chamber

Methodology Applied

Scientific EffectPressure control: Pressure Increase

Data Source

PatentUS20250389019A1Apparatus for supplying a vaporized reactant and associated reactor systems and methods

Publication Date: 2025.12.25 ASM IP HLDG BV

AI summary

Apparatus for supplying a vaporized reactant to a reaction chamber are disclosed. The apparatus disclosed includes a process control chamber in fluid communication with a supply vessel and an injection gas source is fluid communication with the process control chamber and configured to enable modification of the pressure within the process control chamber. Reactor systems including the apparatus for supplying a vaporized reactant to a reaction chamber are also disclosure. Methods for supplying vaporized reactant to a reaction are also disclosed.