Semiconductor Process Display for Lot-to-Wafer Failure Analysis
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Solution Overview
Problem
In semiconductor manufacturing, identifying and analyzing the cause of failures in apparatuses is time-consuming, as existing methods require users to collect and analyze data at the wafer level to determine differences between lots, making it difficult to promptly address issues.
Innovation Solution
An information processing apparatus with an acquisition unit for process information and a display control unit that allows selective display of process data on a lot-by-lot basis and a substrate-by-substrate basis, enabling users to quickly identify and analyze the cause of failures by highlighting differing process conditions.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If statistical process results are displayed as graphs for lots including multiple substrates, then it becomes easy to instantly identify lots with failures, but it becomes difficult to instantly determine the cause of differences between lots
Solution Approach 1:
The patent segments the data display into two hierarchical levels: (1) lot-level statistical graphs for overview and failure identification, and (2) substrate-level detailed data for cause analysis. When a user selects a specific lot from the graphical display, the system automatically drills down to show individual substrate process data for that lot, enabling rapid transition from problem detection to root cause identification without manual data collection
Solution Approach 2:
The patent adds a temporal and hierarchical dimension to the data presentation by organizing process data first by lot (macro level) and then by individual substrate within each lot (micro level). This dimensional organization allows users to navigate from aggregate statistics to detailed individual records through simple selection actions, transforming a time-consuming manual analysis process into an interactive visual exploration
2Measurement precision
If users collect and analyze wafer-level data to determine the cause of differences between lots, then accurate cause determination is achieved, but a significant amount of time is required to overcome failures
Solution Approach 1:
The system performs preliminary organization and preparation of process data in a structured format that links lot-level statistics with substrate-level details before the user needs the information. By pre-processing and arranging the data relationships, the system enables users to access detailed substrate data instantly upon selecting a lot, eliminating the time required for manual data collection and preliminary analysis steps
Data Source
AI summary
An information processing apparatus includes an acquisition unit configured to acquire process information about a substrate process, the process information including process data and a process condition, and a display control unit configured to control a display on a display apparatus based on the process information acquired by the acquisition unit, wherein the display control unit selectively displays, on the display apparatus, a first screen that displays the process data of a lot including a plurality of substrates on a lot-by-lot basis and a second screen that displays the process data of a first lot on a substrate-by-substrate basis, the first lot being a lot designated by a user from the lot displayed on the first screen.