Process Gas Sampling for Accurate Plasma Chamber Feed Analysis
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Solution Overview
Problem
Current substrate processing apparatuses struggle to accurately analyze process gases in a non-plasma status, making it difficult to verify the normal flow of process gases and their mixing ratios during plasma processes.
Innovation Solution
A substrate processing apparatus equipped with a gas analyzer that includes a gas chromatograph and a mass spectrometer, allowing for the analysis of process gases outside the plasma chamber. This apparatus can accurately determine the types and mixing ratios of process gases, enabling real-time control of gas supply.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If optical emission spectroscope (OES) is used to analyze process gases in plasma status, then plasma process can be monitored, but reaction product gases and by-product gases interfere with accurate detection of original process gases
Solution Approach 1:
The patent applies preliminary action by analyzing the process gas mixture before it enters the plasma chamber. The gas analysis unit detects the composition of process gases supplied through the gas supply line, allowing verification of gas types and mixing ratios before plasma generation occurs. This prevents interference from reaction product gases that would be present if analysis were performed during plasma processing.
2Measurement precision
If process gases are analyzed only in plasma status using OES, then plasma process monitoring is enabled, but verification of process gas supply accuracy before plasma generation is impossible
Solution Approach 1:
The system performs gas composition analysis in advance through the gas supply line before plasma generation begins. This allows any issues with process gas supply or mixing ratios to be detected before they affect the substrate processing, eliminating delays in problem detection and enabling preventive corrective actions.
3Adaptability or versatility
If multiple process gases are mixed and supplied into the chamber, then complex plasma processes can be performed, but it becomes difficult to verify whether each gas is flowing normally and mixing ratios are correct
Solution Approach 1:
The patent introduces a gas analysis unit as an intermediary component that samples the process gas mixture through the gas supply line before it enters the chamber. This intermediary measurement system provides detailed composition information about the mixed gases, enabling verification of individual gas flows and mixing ratios without interfering with the actual plasma processing capability.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The apparatus allows for precise analysis of process gases in a non-plasma status, ensuring accurate supply and mixing ratios, which stabilizes and improves the quality of plasma processes.
Implementation Method 1
The gas analyzer may include a gas chromatograph and a mass spectrometer. The gas chromatograph may separate the plurality of process gases constituting the inserted process gas mixture by type
Implementation Method 2
The mass spectrometer may include an ionizer for ionizing the inserted process gases, a mass filter for separating ions based on mass-to-charge (m/z) ratios
Implementation Method 3
a mass filter for separating ions based on mass-to-charge (m/z) ratios, and a detector for detecting information about the process gases based on the mass-to-charge ratios
Data Source
AI summary
Provided is a substrate processing apparatus including a chamber having a space where plasma is generated from a process gas mixture and a substrate is processed using the generated plasma, a gas supplier for supplying the process gas mixture to the chamber through a gas transfer line connected to a gas inlet provided in the chamber, and a gas analyzer for analyzing information about a plurality of process gases constituting the process gas mixture, outside the chamber by receiving a portion of the process gas mixture from a sample transfer line connected to the gas transfer line.