Processed Substrate Through-Hole Alignment via Simultaneous Exposure

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Solution Overview

Problem

The challenge lies in forming through-holes in processed substrates with aligned central axes, as existing methods struggle to ensure matching opening sizes on both surfaces due to differences in photosensitive resin layer thickness and exposure, leading to misalignment and potential cracking, especially in downsized wafers.

Innovation Solution

A method involving a light transmissive substrate with through-holes having a larger and smaller opening diameter, where the larger opening is no more than 5% larger than the smaller, achieved by exposing photosensitive resin layers on both surfaces simultaneously, with one surface irradiated and the other surface receiving reflected light to ensure equal exposure and matched pattern sizes.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If through-holes are formed in processed substrates using conventional photosensitive resin layer methods, then the substrate can be manufactured, but the opening sizes on both surfaces become mismatched leading to misalignment and potential cracking

Engineering Contradiction:
Improvealignment precision of through-hole openingsVSAvoidsubstrate strength
Core Design Contradiction:
Manufacturing precisionVSReliability

Solution Approach 1:

The patent applies parameter changes by controlling the thickness of photosensitive resin layers on both surfaces of the substrate and adjusting exposure conditions to ensure that the pattern sizes formed on both surfaces are substantially equal. This results in through-hole openings with matched dimensions, preventing misalignment and cracking while maintaining substrate strength.

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent employs preliminary action by forming patterns on both surfaces of the substrate before forming the through-holes. The patterns are designed and formed in advance with controlled dimensions to ensure that when etching is performed, the through-hole openings on both surfaces will be substantially equal in size, preventing subsequent misalignment issues.

Inventive Principle:
Principle #10Preliminary action

2Productivity

If the processed substrate is downsized to match the wafer size, then integration density is improved, but the through-hole openings become too fine to align accurately

Engineering Contradiction:
Improveintegration densityVSAvoidpattern alignment accuracy
Core Design Contradiction:
ProductivityVSManufacturing precision

Solution Approach 1:

The patent applies parameter changes by carefully controlling the thickness of photosensitive resin layers and exposure parameters to maintain pattern sizes that are substantially equal on both surfaces, even when the substrate is downsized. This ensures that through-hole openings remain alignable and prevent cracking in the downsized configuration.

Inventive Principle:
Principle #35Parameter changes

3Ease of manufacture

If removal liquid is introduced through through-holes to detach the processed substrate, then the substrate can be removed, but misaligned openings reduce removal efficiency

Engineering Contradiction:
Improvesubstrate removal efficiencyVSAvoidopening alignment
Core Design Contradiction:
Ease of manufactureVSManufacturing precision

Solution Approach 1:

The patent applies parameter changes by controlling photosensitive resin layer thickness and exposure conditions to ensure through-hole openings on both surfaces are substantially equal in size and properly aligned. This alignment ensures efficient removal liquid flow through the through-holes, improving substrate removal efficiency.

Inventive Principle:
Principle #35Parameter changes

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach results in through-holes with matched opening sizes on both surfaces, enhancing the substrate's strength and efficiency in manufacturing, while preventing cracking and ensuring effective removal liquid access during processing.

Implementation Method 1

irradiating one surface of the substrate with light which then passes through to the other surface

Methodology Applied
Scientific EffectLight transmission: Light

Implementation Method 2

forming a pattern in each of photosensitive resin layers on respective surfaces of the substrate by exposing the each of photosensitive resin layers to light

Methodology Applied
Scientific EffectPhotopolymerization: Photopolymerisation

Data Source

PatentUS9017932B2Processed substrate and method for manufacturing same
Publication Date: 2015.04.28 TOKYO OHKA KOGYO CO LTD
  • US9017932B2 patent drawing
  • US9017932B2 patent drawing
  • US9017932B2 patent drawing

AI summary

A processed substrate and a method for easily manufacturing the processed substrate with high efficiency are provided, the processed substrate having openings in respective surfaces thereof that are matched to each other in size. The processed substrate includes a light transmissive substrate having a plurality of through-holes. Each of the through-holes has a large-diameter opening and a small-diameter opening, the large-diameter opening being larger in size than the small-diameter opening by 5% or less of the size of the large-diameter opening. As such, through-holes with openings in the respective surfaces of the processed substrate that are matched to each other in size can be provided.