Processing Apparatus Transverse Member Water Scattering Prevention
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Solution Overview
Problem
Existing processing apparatuses for chip fabrication face challenges in preventing processing water from being scattered out of the processing chamber, leading to increased complexity and cost due to the need for complex seal mechanisms like water supply systems forming water films.
Innovation Solution
A processing apparatus with a simple structure featuring a transverse member extending from the side plate to the delivery port, creating a large gap that allows scattered processing water to contact and stay within the pedestal or transverse member, effectively preventing water from escaping the chamber.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Object-affected harmful factors
If a water supply mechanism is used to form a water film in the gap between the pedestal and side wall to seal the delivery port, then processing water scattering is prevented, but the device complexity and manufacturing cost increase
Solution Approach 1:
The patent extracts the water supply mechanism from the seal system, removing the complex active sealing component. Instead of using a water film formed by supply mechanisms, the invention uses a simple physical barrier (the pedestal itself positioned in the delivery port) to prevent water scattering, thereby reducing device complexity while maintaining the function of preventing processing water from escaping the chamber
Solution Approach 2:
The pedestal structure serves dual functions: it is both a support component for the processing apparatus and a passive sealing element that prevents water scattering simply by its presence in the delivery port. This self-service approach eliminates the need for separate active sealing mechanisms, reducing complexity while maintaining effectiveness
2Object-affected harmful factors
If a water supply mechanism is used to seal the delivery port, then processing water containment is improved, but the manufacturing cost increases
Solution Approach 1:
The patent removes the water supply mechanism entirely from the sealing function. The sealing action is achieved passively by the pedestal's physical presence in the delivery port, which is already a required component for supporting the processing apparatus. This eliminates additional manufacturing costs associated with water supply systems while maintaining effective water containment
Solution Approach 2:
The pedestal is designed to serve multiple functions simultaneously: it provides structural support for the processing apparatus and acts as a passive seal to prevent water scattering. This multi-functionality eliminates the need for separate sealing components, thereby reducing manufacturing costs while maintaining processing water containment effectiveness
Data Source
AI summary
A processing apparatus includes a processing chamber cover having a first transverse member extending from between a first side plate and a first delivery port defined in the first side plate outwardly of a first processing chamber. The width of a gap between the first transverse member and a pedestal positioned in the first delivery port when a workpiece is processed in the first processing chamber, i.e., the length of the gap along the direction toward the outside of the processing chamber, is large. When processing water that is scattered passes through the gap, the processing water will likely contact the pedestal or the first transverse member and stay in the gap. As a result, the processing water is effectively prevented from being scattered out of the first processing chamber by a simple structure, compared with water supply means for forming a water film in the gap.