Processing Bath Exhaust Layout for Substrate Mist Control
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Solution Overview
Problem
The issue of chemical solution mist resettling on display substrates during processing, leading to process defects, is not adequately addressed by existing substrate processing apparatuses due to suboptimal exhaust systems.
Innovation Solution
The apparatus incorporates a first exhaust unit with elongated bodies and exhaust holes aligned differently from the substrate direction, a partition wall with an obtuse angle, and a drop prevention structure to manage mist and chemical solution flow, minimizing defects.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a conventional exhaust system is used in the processing bath, then the structure is simple, but chemical solution mist resettles on the substrate causing process defects
Solution Approach 1:
The exhaust system is segmented into multiple functional components: a partition wall dividing the processing bath, exhaust units with exhaust holes positioned at specific locations, and an L-shaped drop prevention structure. This segmentation allows each component to perform its specific function (mist extraction, chemical solution containment) effectively, preventing mist resettlement on substrates while maintaining manageable system complexity
Solution Approach 2:
The partition wall acts as an intermediary structure between different processing zones. It includes exhaust holes that serve as intermediaries for mist extraction and an L-shaped drop prevention structure that intermediates the flow path of chemical solutions, guiding them away from substrates. This intermediary approach resolves the contradiction by introducing specialized components that target specific problems without requiring complete system redesign
2Object-affected harmful factors
If the exhaust unit is positioned to effectively remove mist, then mist control improves, but chemical solution may flow onto the substrate through the partition wall entrance
Solution Approach 1:
The partition wall is designed with local quality variations: exhaust holes are positioned at specific heights and locations to target mist extraction zones, while the L-shaped drop prevention structure is positioned at the entrance to specifically address chemical solution flow. This localized functional differentiation allows effective mist removal at exhaust locations while preventing chemical solution contamination at the substrate entrance, resolving the contradiction between mist control and chemical solution management
3Ease of operation
If the partition wall entrance is open for substrate passage, then substrate transfer is enabled, but chemical solution flows down and resettles on substrates
Solution Approach 1:
The L-shaped drop prevention structure is installed at the partition wall entrance before substrates pass through. This preliminary action creates a protective barrier that intercepts chemical solution flow downward along the partition wall, preventing it from reaching substrates. The structure is positioned in advance to address the potential contamination issue while maintaining uninterrupted substrate transfer, resolving the contradiction between ease of operation and manufacturing precision
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration effectively controls mist and chemical solution flow, reducing process defects by stabilizing the exhaust and guiding mist and solution away from the substrate.
Implementation Method 1
a first exhaust unit disposed between the first processing bath and the second processing bath, connected to the first partition wall, comprising a plurality of exhaust holes disposed along a second direction different from the first direction, and for exhausting mist in the first processing bath
Implementation Method 2
an L-shaped drop prevention structure installed in an upper portion of the entrance of the first partition wall and for receiving the chemical solution flowing down along the first partition wall
Data Source
AI summary
A substrate processing apparatus capable of minimizing process defects by controlling mist in a processing bath is provided. The substrate treating apparatus comprises a first processing bath and a second processing bath disposed adjacent to each other in a first direction, a first partition wall disposed between the first processing bath and the second processing bath and having an entrance, through which a substrate passes, a transfer unit installed in the first processing bath and the second processing bath and for moving the substrate, a chemical solution supply unit installed in the first processing bath and for providing a chemical solution to the substrate, and a first exhaust unit disposed between the first processing bath and the second processing bath, connected to the first partition wall, comprising a plurality of exhaust holes disposed along a second direction different from the first direction, and for exhausting mist in the first processing bath.