Projection Optical System Correction for Exposure Apparatus

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

Existing projection exposure systems struggle to accurately correct imaging characteristics due to variations in environment conditions like atmospheric pressure, temperature, and humidity, as previous methods rely on a single correction coefficient that does not account for variations in the effective light source, numerical aperture, and mask pattern conditions.

Innovation Solution

An exposure method that calculates and applies correction amounts for the projection optical system based on parameters such as the numerical aperture of the illumination and projection optical systems, and the size and pitch of the pattern, to adjust for changes in environment conditions, specifically using a calculation step and a correction step to drive optical and wafer stages accordingly.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of manufacture

If a single correction coefficient is used for atmospheric pressure changes, then the correction method is simple, but the imaging characteristics cannot be accurately corrected when effective light source, numerical aperture, or mask pattern conditions change

Engineering Contradiction:
Improvecorrection method simplicityVSAvoidimaging characteristics correction accuracy
Core Design Contradiction:
Ease of manufactureVSManufacturing precision

Solution Approach 1:

The patent applies parameter changes by making the correction coefficient variable based on multiple parameters including effective light source type, numerical aperture, and mask pattern conditions. Instead of using a fixed single coefficient, the system selects or calculates appropriate correction coefficients according to the specific combination of these parameters, thereby adapting the correction to match the actual imaging conditions and achieving accurate correction across different operational scenarios

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent implements dynamics by transitioning from a static single correction coefficient to a dynamic multi-parameter correction system. The correction coefficient is no longer fixed but changes dynamically based on the effective light source, numerical aperture, and mask pattern conditions. This dynamic adjustment allows the correction system to respond to varying imaging conditions and maintain accuracy across different operational parameters

Inventive Principle:
Principle #15Dynamics

2Manufacturing precision

If correction coefficients are determined for each combination of effective light source, numerical aperture, and mask pattern, then the imaging characteristics correction accuracy is improved, but the device complexity increases

Engineering Contradiction:
Improveimaging characteristics correction accuracyVSAvoidcorrection system complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent applies segmentation by dividing the correction system into multiple independent correction coefficients, each corresponding to specific combinations of effective light source, numerical aperture, and mask pattern conditions. This segmentation allows the complex correction problem to be broken down into manageable segments that can be handled independently, with each segment addressing a specific set of conditions while collectively providing comprehensive correction coverage

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The patent uses an intermediary approach by introducing a parameter-based selection mechanism that acts as a mediator between the varying imaging conditions and the appropriate correction coefficients. This intermediary system automatically selects or calculates the correct correction coefficient based on the current effective light source, numerical aperture, and mask pattern conditions, thereby managing the complexity through intelligent parameter matching rather than requiring manual configuration for each scenario

Inventive Principle:
Principle #24Intermediary (Mediator)

Data Source

PatentUS9329489B2Exposure method, exposure apparatus, and method of manufacturing device
Publication Date: 2016.05.03 CANON KK
  • US9329489B2 patent drawing
  • US9329489B2 patent drawing
  • US9329489B2 patent drawing

AI summary

An exposure method comprises a calculation step of calculating a correction amount of a correction unit which corrects a change in imaging characteristics of a projection optical system based on at least one of parameters including a numerical aperture and effective light source of an illumination optical system, a numerical aperture of the projection optical system, and a size and pitch of a pattern, and an amount of change in environment condition in the projection optical system; and a correction step of making the correction unit operate in accordance with the correction amount calculated in the calculation step.