Projector Distortion Correction Using Dual Pattern Detection
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Solution Overview
Problem
Current projectors face inefficiencies in detecting the image adjustment pattern on a projection surface due to the unknown positional relation between the projector and the surface, leading to time-consuming searches for the adjustment image.
Innovation Solution
A projector system that projects an image with a first and second pattern, where the second pattern is easily detectable and less affected by the zoom ratio, allowing for rapid detection of the first pattern's position based on the second pattern's position, facilitating quick and accurate distortion correction.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If the projector searches the entire projection surface for the image for adjustment, then the detection is thorough, but the time required for detection increases significantly
Solution Approach 1:
The image for adjustment is divided into two distinct patterns: a first pattern (e.g., rectangular frame) for distortion correction and a second pattern (e.g., circular pattern) for rapid location detection. This segmentation allows the system to first quickly locate the image using the easily detectable second pattern, then focus on detecting the first pattern within a limited search area, thereby reducing overall detection time while maintaining accuracy.
Solution Approach 2:
The second pattern is designed to be projected at a known position (near the optical axis intersection with the projection surface) and made easily detectable. This preliminary detection establishes a reference point that guides the subsequent search for the first pattern, eliminating the need to search the entire projection surface and significantly reducing detection time.
2Speed
If the first pattern is designed for easy detection, then the detection speed improves, but the distortion correction accuracy may be compromised
Solution Approach 1:
The detection function is split between two patterns with different characteristics. The second pattern (e.g., circular) is optimized for rapid detection and location, while the first pattern (e.g., rectangular frame with specific aspect ratio) is optimized for accurate distortion correction. This segmentation allows each pattern to excel at its specific function without compromising the other.
Solution Approach 2:
The second pattern acts as an intermediary that facilitates the detection process. It is easily detectable and provides positional information that guides the detection of the first pattern. This intermediary pattern enables the system to quickly locate the image for adjustment and then focus computational resources on accurately detecting the first pattern for distortion correction.
3Adaptability or versatility
If the projector position relative to the projection surface is unknown, then the system is flexible in placement, but the detection of the image for adjustment becomes time-consuming
Solution Approach 1:
The second pattern is projected at a position that is equipotential in terms of detectability - near the intersection of the optical axis with the projection surface. This position is less affected by zoom ratio changes and maintains consistent detectability regardless of the projector's distance or angle relative to the projection surface. This allows the system to quickly locate the image for adjustment without needing to know the exact projector position, maintaining placement flexibility while reducing search time.
Data Source
AI summary
A projector includes a projecting unit configured to project an image on a projection surface, a projection control unit configured to cause the projecting unit to project a correction pattern including a first pattern and a second pattern, and a correction control unit configured to detect the first pattern and the second pattern included in the projected correction pattern and correct distortion of the projected image. The correction control unit detects the second pattern projected on a screen and detects the position of the first pattern on the basis of the position of the detected second pattern.