Protection Electrode for Defect-Resistant Thin Film Transistor Array Panel

Solution Overview

Problem

Liquid crystal displays (LCDs) face issues with side visibility due to disconnected wiring during the photolithography process, which affects the reliability of field-generating electrodes in thin film transistor array panels.

Innovation Solution

A thin film transistor array panel design that includes a protection electrode made of the same material as the field-generating electrodes, extending along the data line to ensure continuous signal transmission even if the data line is disconnected, and a manufacturing method that forms these electrodes to prevent disconnection during the photolithography process.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If photolithography process is used to form wiring for field generating electrodes, then wiring can be formed with precise patterns, but wiring may be disconnected during the process

Engineering Contradiction:

Improvewiring pattern precisionVSAvoidwiring connection reliability

Core Design Contradiction:

Manufacturing precisionVSReliability

Solution Approach 1:

The protection electrode is formed in advance along the data line before the photolithography process that may cause disconnection. This preliminary structure ensures that even if the data line is disconnected during subsequent processing, the protection electrode maintains the electrical connection path.

Inventive Principle:

Principle #10Preliminary action

Solution Approach 2:

The protection electrode acts as an intermediary element between the source electrode and the pixel electrode. It provides an alternative conduction path that mediates the electrical connection, ensuring signal transmission continues even when the primary data line connection is compromised.

Inventive Principle:

Principle #24Intermediary (Mediator)

2Device complexity

If data line is formed without protection electrode, then device structure is simpler, but data line may be disconnected affecting display quality

Engineering Contradiction:

Improveelectrode structure complexityVSAvoiddata line connection reliability

Core Design Contradiction:

Device complexityVSReliability

Solution Approach 1:

The protection electrode is formed in advance along the data line before the photolithography process that may cause disconnection. This preliminary structure ensures that even if the data line is disconnected during subsequent processing, the protection electrode maintains the electrical connection path.

Inventive Principle:

Principle #10Preliminary action

Solution Approach 2:

The protection electrode serves as a pre-prepared backup connection that cushions against the potential harm of data line disconnection. By having this protective structure in place beforehand, the system is prepared to maintain functionality even when the primary data line fails.

Inventive Principle:

Principle #11Beforehand cushioning (Prior cushioning)

3Productivity

If wiring disconnection occurs during photolithography, then manufacturing process is completed, but display defects increase

Engineering Contradiction:

Improvemanufacturing process efficiencyVSAvoiddisplay quality

Core Design Contradiction:

ProductivityVSReliability

Solution Approach 1:

The protection electrode is formed in advance along the data line before the photolithography process that may cause disconnection. This preliminary structure ensures that even if the data line is disconnected during subsequent processing, the protection electrode maintains the electrical connection path.

Inventive Principle:

Principle #10Preliminary action

Solution Approach 2:

The protection electrode converts the potential harm of data line disconnection into a beneficial outcome by providing an alternative conduction path. What would normally be a defect-causing event becomes manageable, as the protection electrode ensures continued functionality despite the disconnection.

Inventive Principle:

Principle #22Blessing in disguise (Convert harm into benefit)

Data Source

PatentUS9048143B2Defect-resistant thin film transistor array panel and manufacturing method thereof

Publication Date: 2015.06.02 SAMSUNG DISPLAY CO LTD

AI summary

A thin film transistor array panel according to an exemplary embodiment of the present invention includes a substrate; a gate line disposed on the substrate; a gate insulating layer disposed on the gate line; a semiconductor disposed on the gate insulating layer; a data line disposed on the semiconductor and including a source electrode; a drain electrode disposed on the semiconductor and facing the source electrode; a first electrode disposed on the gate insulating layer; a protection electrode disposed on the data line; a passivation layer disposed on the first electrode and the protection electrode; and a second electrode disposed on the passivation layer, wherein the protection electrode comprises the same material as the first electrode.