Protective Ring Structure for Accurate Waveguide Light Pipe Etching

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Solution Overview

Problem

Integrated optical waveguides in integrated circuits face challenges with etch processes that can damage the grating coupler structure and reduce quantum efficiency due to over-etching or incomplete light pipe formation, leading to reduced sensitivity and structural integrity.

Innovation Solution

A protective ring structure is formed over the grating coupler to facilitate controlled light pipe formation through a series of etch processes, preventing damage and ensuring accurate height and integrity of the light pipe opening, thereby enhancing the quantum efficiency and structural integrity of the integrated optical waveguide.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If etch processes are used to form light pipe structures, then light pipe formation is achieved, but the grating coupler structure can be damaged due to over-etching

Engineering Contradiction:
Improvelight pipe formation accuracyVSAvoidgrating coupler structural integrity
Core Design Contradiction:
Manufacturing precisionVSReliability

Solution Approach 1:

A protective ring structure is formed over the grating coupler before the etch process to prevent damage. This preliminary protective measure allows the etch process to proceed with greater aggressiveness to form the light pipe structure accurately, while the protective ring absorbs or deflects any over-etching that might otherwise damage the grating coupler.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The protective ring structure acts as an intermediary element between the etch process and the grating coupler. It provides a sacrificial layer that protects the sensitive grating coupler from direct exposure to the etchant, enabling precise light pipe formation without compromising the grating coupler's structural integrity.

Inventive Principle:
Principle #24Intermediary (Mediator)

2Productivity

If aggressive etching is used to ensure complete light pipe formation, then light pipe completeness is improved, but quantum efficiency decreases due to grating coupler damage

Engineering Contradiction:
Improvelight pipe formation completenessVSAvoidquantum efficiency
Core Design Contradiction:
ProductivityVSLoss of energy

Solution Approach 1:

The protective ring is formed in advance to enable aggressive etching that ensures complete light pipe formation. By having this protective structure in place beforehand, the etch process can be optimized for completeness without worrying about damaging the grating coupler, thus maintaining high quantum efficiency.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The protective ring structure provides beforehand cushioning or protection against the harmful effects of aggressive etching. This allows the manufacturing process to achieve complete light pipe formation while the protective ring absorbs the excess etching energy, preventing damage to the grating coupler and preserving quantum efficiency.

Inventive Principle:
Principle #11Beforehand cushioning (Prior cushioning)

3Reliability

If protective measures are added to prevent grating coupler damage, then structural integrity is improved, but device complexity increases

Engineering Contradiction:
Improvegrating coupler structural integrityVSAvoidwaveguide structure complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The protective ring structure provides localized protection only where it is needed - over the grating coupler region. This targeted approach protects the critical area without adding unnecessary complexity to the entire waveguide structure. The protective ring can be selectively formed and removed only in specific locations, maintaining simplicity in non-critical areas.

Inventive Principle:
Principle #3Local quality

Solution Approach 2:

The protective ring is a temporary, extractable element that is added only for the duration of the etch process. After serving its protective function, it can be removed or left as a non-interfering remnant. This approach adds minimal permanent complexity to the device while providing necessary protection during manufacturing.

Inventive Principle:
Principle #2Taking out (Extraction)

Data Source

PatentUS12066659B2Protective ring structure to increase waveguide performance
Publication Date: 2024.08.20 TAIWAN SEMICONDUCTOR MANUFACTURING CO LTD
  • US12066659B2 patent drawing
  • US12066659B2 patent drawing
  • US12066659B2 patent drawing

AI summary

Various embodiments of the present disclosure are directed towards an integrated chip including an optical device disposed on a substrate. A dielectric structure overlies the substrate. The dielectric structure comprises one or more sidewalls defining a light channel over a region of the optical device. A protective structure is above the optical device and disposed on opposing sides of the light channel.