Pulse-Sequence Magnetron Control for Wafer Annealing Interference
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Solution Overview
Problem
In semiconductor device manufacturing, using multiple magnetrons for microwave annealing results in interference and increased reflection waves due to simultaneous microwave generation, making it difficult to effectively supply power to larger wafers.
Innovation Solution
A microwave irradiation device and method that employs a power supply unit to provide pulse-shaped voltage to multiple magnetrons, preventing temporal overlap of voltage pulses to avoid simultaneous microwave generation, thus reducing interference and reflection waves.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Power
If multiple magnetrons are used to provide sufficient power for large wafers, then the power supply capability is improved, but the electromagnetic wave interference and reflection waves are increased
Solution Approach 1:
The patent applies periodic action by supplying pulse-shaped voltages to multiple magnetrons in a time-sequenced manner rather than continuously. The power supply unit alternates the activation of different magnetrons, ensuring that only one magnetron operates at any given time. This periodic operation allows sufficient power delivery to large wafers while preventing electromagnetic wave interference and reflection waves that would occur with simultaneous operation.
Solution Approach 2:
The patent implements preliminary action by pre-planning the activation sequence of multiple magnetrons through the power supply unit. Before any microwave generation occurs, the system establishes a time-sequenced activation schedule that ensures magnetrons are activated one after another in a controlled manner. This preliminary arrangement prevents interference and reflection waves from the outset while maintaining the required power level for large wafer processing.
2Productivity
If multiple magnetrons operate simultaneously to increase power output, then the processing capacity is improved, but the electromagnetic wave interference increases
Solution Approach 1:
The system maintains high processing capacity by using periodic action with multiple magnetrons activated in rapid succession. The power supply unit cycles through different magnetrons in a time-sequenced manner, ensuring that at least one magnetron is always active to process large wafers efficiently. This periodic operation prevents electromagnetic wave interference that would occur with simultaneous operation while maintaining the required processing throughput.
Solution Approach 2:
The patent applies segmentation by dividing the power supply task among multiple magnetrons that operate in sequence rather than having them operate simultaneously. Each magnetron handles a specific time segment of the overall processing cycle, contributing to the total power output needed for large wafer processing. This segmentation approach maintains processing capacity while eliminating the electromagnetic interference problem associated with simultaneous operation.
3Object-generated harmful factors
If pulse-shaped voltage is supplied to prevent simultaneous microwave generation, then the reflection waves are reduced, but the system complexity increases
Solution Approach 1:
The patent manages system complexity by implementing a relatively simple periodic control mechanism in the power supply unit. The control system uses basic timing circuits to alternate the activation of multiple magnetrons in a fixed sequence, which is straightforward to implement and maintain. This periodic action effectively reduces reflection waves by preventing simultaneous microwave generation while keeping the added system complexity minimal through the use of simple time-sequenced control logic.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach allows for effective microwave power supply to the object being processed, increasing electric field intensity and improving its uniformity, enhancing the annealing process.
Implementation Method 1
a plurality of magnetrons for generating microwaves and irradiating the microwaves to the object to be processed in the chamber
Implementation Method 2
the electromagnetic waves (microwaves) from the magnetrons interfere with each other
Implementation Method 3
a microwave irradiation device and a microwave irradiation method for performing processes such as heating and the like by irradiating microwaves to an object
Data Source
AI summary
A microwave irradiation device includes a chamber for accommodating an object to be processed; a plurality of magnetrons for generating microwaves and irradiating the microwaves to the object to be processed in the chamber; and a power supply unit for supplying a pulse-shaped voltage to each magnetron. The power supply unit supplies the pulse-shaped voltage to the magnetrons while preventing temporal overlap of voltage pulses of the pulse-shaped voltage supplied to the respective magnetrons with each other.