Pulse System Verification Using Optical and Profile Sensors
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Solution Overview
Problem
Current semiconductor processes lack a system or sensor to verify the accurate operation of pulse systems, including RF generators, and ensure matching of pulse characteristics across tools, such as waveform, frequency, and duty cycle.
Innovation Solution
A method and apparatus for verifying pulse systems involve generating pulse profiles using profile sensors and optical sensors, comparing them to representative profiles of properly operating systems, and determining operational accuracy using quantitative metrics, with the ability to de-convolute pulses for analysis.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If no verification system is implemented, then device complexity is reduced, but measurement precision of pulse characteristics deteriorates
Solution Approach 1:
An optical sensor acts as an intermediary device to measure pulse characteristics from RF generators without directly interfering with the pulse generation process. The sensor converts electromagnetic pulse signals into measurable optical signals, enabling verification while maintaining system simplicity.
Solution Approach 2:
The patent replaces direct electrical measurement methods with optical measurement methods. By using optical sensors to detect pulse characteristics through light interactions with the plasma or electromagnetic field, the system achieves precise measurement without complex electrical contact systems.
2Manufacturing precision
If pulse characteristics are not verified across tools, then manufacturing precision deteriorates, but device complexity is reduced
Solution Approach 1:
The patent creates a reference pulse profile from a properly operating tool and uses this copy as a standard for comparing other tools. By storing and comparing against this reference profile, the system ensures manufacturing precision across multiple tools without requiring each tool to be individually calibrated with complex procedures.
Solution Approach 2:
The system measures and compares key pulse parameters such as duty cycle, frequency, and waveform shape across different tools. By focusing on these critical parameters and using quantitative metrics for comparison, the patent achieves consistent manufacturing precision without implementing comprehensive complex verification for all possible parameters.
3Measurement precision
If quantitative metrics are not defined for pulse comparison, then measurement precision is reduced, but ease of operation is improved
Solution Approach 1:
The patent implements automated feedback by defining quantitative metrics that automatically compare measured pulse characteristics against reference profiles. The system provides clear pass/fail or deviation-based feedback, eliminating the need for operators to manually analyze complex waveforms and making the verification process both precise and easy to operate.
Solution Approach 2:
The system focuses on measuring and comparing only the most critical pulse characteristics using defined quantitative metrics, rather than attempting to analyze every aspect of the pulse waveform. This partial action approach achieves sufficient measurement precision for manufacturing purposes while keeping the operation simple and manageable.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Ensures the accurate operation of pulse systems and resulting waveforms in semiconductor processes by identifying similarities and differences, thereby ensuring proper functioning and matching of pulse characteristics across tools.
Implementation Method 1
generating a pulse profile of pulses of at least one pulse generator of the pulsing system using measurements of outputs of the at least one pulse generator from the profile sensor
Implementation Method 2
generating a pulse profile of a plasma process in a process chamber in which plasma is ignited including different pulse modes of the at least one pulse generator of the pulsing system using measurements of images of the plasma process taken by the optical sensor
Data Source
AI summary
A system for verifying the operation of RF generators and resulting pulse waveforms in semiconductor processes includes a process chamber, a profile sensor, an optical sensor and a controller. A process implemented by the controller of the system for verifying the operation of RF generators and resulting pulse waveforms in semiconductor processes includes generating a pulse profile of a pulse shape of an RF generator under test, selecting a stored, representative profile of an RF generator known to be operating correctly to compare to the profile generated for the RF generator for a same pulse mode, defining a quantitative metric/control limit to identify similarities and/or differences between pulses of same pulse modes between the generated profile of the RF generator and the stored profile, comparing the generated profile and the selected stored profile, and determining if the RF generator under test is operating properly based on the comparison.