Pulsed Cathodic Arc Coating with Time-Shifted Cathodes
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Solution Overview
Problem
Current cathodic arc evaporation methods struggle to maintain high deposition rates, ionization, robustness, and low costs while effectively influencing the mechanical properties of deposited layers.
Innovation Solution
A cathodic arc evaporation apparatus with multiple pulsed cathodes made of different materials and a pulsed bias voltage, where the arc discharges are time-shifted and synchronized with the bias voltage to provide varying energies to ions, allowing for selective control of mechanical properties in the deposited layer.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If cathodic arc evaporation is used to achieve high deposition rates and high ionization, then productivity and layer quality are improved, but the ability to influence mechanical properties of the deposited layer is limited
Solution Approach 1:
The patent applies periodic action by using pulsed cathode arcs instead of continuous arcs. The pulsed operation allows for time-varying control of ionization and deposition parameters, enabling independent optimization of deposition rate and mechanical property control. The periodic pulsing creates distinct phases within each cycle that can be tailored to achieve both high productivity and property control.
Solution Approach 2:
The patent implements dynamics by making the cathode arc discharge variable in time through pulsed operation. The pulse parameters (amplitude, width, frequency, duty cycle) can be dynamically adjusted to optimize both deposition rate and ion energy, providing adaptability to influence mechanical properties while maintaining high productivity.
2Adaptability or versatility
If multiple cathodes with different materials are used to control mechanical properties, then adaptability is improved, but device complexity increases
Solution Approach 1:
The patent applies segmentation by dividing the cathode into multiple separate cathodes made of different materials, each capable of being pulsed independently. This allows different materials to be deposited in controlled sequences or combinations, enabling precise control over the mechanical properties of the composite deposited layer while maintaining modular simplicity.
3Manufacturing precision
If pulsed mode operation is used to control ion energy, then manufacturing precision is improved, but device complexity increases
Solution Approach 1:
The patent applies parameter changes by utilizing the pulsed mode operation to dynamically vary the energy parameters of the cathode arc discharge. By adjusting pulse amplitude, width, frequency, and duty cycle, the ion energy can be precisely controlled during deposition, enabling manufacturing precision in controlling mechanical properties without requiring overly complex additional equipment.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration enables high deposition rates, robustness, and cost-effectiveness while allowing for precise control over the mechanical properties of the deposited layers, such as hardness and tensile stress, by adjusting the energy of ions from different cathodes.
Implementation Method 1
cathodic arc evaporation deposition (hereinafter referred to only as cathodic arc evaporation deposition)... the cathode vaporizes and emits ions from the cathode surface in addition to electrons due to high temperature of so-called cathode spot
Implementation Method 2
physical vapor deposition (PVD)... material is vaporized from the cathode by a high-power electric arc, by heat or by high-energy particles. The vaporized material then condenses on the substrate, forming a thin film on the substrate
Implementation Method 3
A so-called bias voltage can be applied to the substrate to provide an adjustable amount of energy to the ions on impact
Implementation Method 4
The vacuum chamber is configured to ignite an arc between the at least one anode (that is, a first anode or the common anode) and the first cathode by a pulsed first cathode arc discharge
Data Source
Figure 1~2
AI summary
The present disclosure is directed to a cathodic arc evaporation apparatus (2) for coating at least one substrate (6), comprising a vacuum chamber (4) in which a physical vapour deposition can be carried out; at least one substrate (6) to be coated being arranged in the vacuum chamber (4); and a bias voltage supply (40) for powering the at least one substrate (6) being configured to be operated in pulsed mode; wherein a pulsed first cathode arc discharge (16) and a pulsed second cathode arc discharge (26) are time-shifted relative to each other and are in synchronization with a pulsed bias voltage (42).