Pulsed Electron Beam Current Probe for High Resistance Defect Detection
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Solution Overview
Problem
Conventional electron beam current probes struggle to detect high resistance defects in conductive structures using a single probe, as these defects do not result in electrical opens and can only detect high resistances near open circuit points, limiting their sensitivity and applicability.
Innovation Solution
A pulsed electron beam current probe method that connects a conductive probe to a sample, irradiates a pulsed electron beam along the conductive structure to generate an alternating current, and determines high resistance defects based on the delay of the rising edge and decrease in amplitude of the alternating current waveform, allowing for the detection of high resistance defects without requiring both ends of the defective line to be physically exposed.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If a conventional electron beam current probe is used to detect high resistance defects, then the probe can detect electrical opens, but it cannot detect high resistance defects that do not result in electrical opens
Solution Approach 1:
The patent applies periodic action by using pulsed electron beam irradiation instead of continuous irradiation. The pulsed electron beam generates alternating current in the conductive probe, enabling detection of high resistance defects through waveform analysis. This periodic excitation allows the system to detect defects that do not result in electrical opens, thereby improving both measurement precision and detection coverage simultaneously
Solution Approach 2:
The patent changes the electrical state parameter by transitioning from direct current (DC) measurement to alternating current (AC) measurement through pulsed electron beam irradiation. By analyzing the alternating current waveform characteristics (amplitude, phase, frequency), the system can detect high resistance defects with enhanced sensitivity, resolving the contradiction between measurement precision and detection coverage
2Device complexity
If a single probe is used to measure electrical current, then the measurement setup is simple, but the ability to detect high resistance defects is limited
Solution Approach 1:
The patent maintains single probe simplicity while improving measurement precision by implementing periodic electron beam irradiation. The pulsed irradiation generates alternating current that reveals high resistance defects through waveform analysis, achieving enhanced detection capability without increasing device complexity
Solution Approach 2:
The patent transforms the measurement approach by changing from DC to AC parameters through pulsed electron beam irradiation. This parameter change enables the single probe to detect high resistance defects that would be invisible in DC measurements, improving measurement precision while maintaining configuration simplicity
3Ease of operation
If both ends of a defective line are physically exposed, then conventional probes can detect high resistance defects, but the method requires both ends to be accessible
Solution Approach 1:
The patent uses periodic electron beam irradiation to generate alternating current that can detect high resistance defects from a single accessible point. This eliminates the requirement for both ends to be physically exposed while maintaining detection accuracy through waveform analysis of the alternating current signal
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables the detection of high resistance defects with enhanced sensitivity, even when they do not result in electrical opens, by analyzing changes in the alternating current waveform, thereby improving the ability to characterize resistive properties of conductive structures.
Implementation Method 1
irradiating a pulsed electron beam along the conductive structure to generate an alternating current in the conductive probe
Data Source
AI summary
An electron beam absorbed current measurement method includes connecting a conductive probe to a conductive structure of a sample, irradiating a pulsed electron beam along the conductive structure to generate an alternating current in the conductive probe, and determining a presence of a high resistance defect in the conductive structure based on at least one of a delay of a rising edge of the alternating current waveform and a decrease in amplitude of the alternating current waveform.


