Pulsed Laser Plating on Glass Substrates
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Solution Overview
Problem
Existing methods for forming metal film patterns on glass substrates are either complex, require expensive special glass substrates, or fail to achieve highly adherent plating films, limiting their widespread use in circuit applications.
Innovation Solution
A method involving pulsed laser irradiation of a glass substrate to create a pattern, followed by selective attachment and removal of an electroless plating catalyst, and subsequent electroless plating to form a highly adherent metal film pattern, using a chelate compound like amino acids for catalyst removal, and metals such as nickel, copper, or gold.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Strength
If conventional electroless plating is used on glass substrates, then the process is simple, but the plating film does not adhere well to the glass surface
Solution Approach 1:
The glass substrate surface is pre-treated with laser irradiation before plating to create micro-roughness and reactive groups, preparing the surface in advance to enhance plating film adhesion. This preliminary surface modification enables strong bonding without complicating the overall plating process.
Solution Approach 2:
The surface properties of the glass substrate are changed through laser irradiation, modifying parameters such as surface roughness, chemical composition, and wettability. These parameter changes create an optimized surface state that significantly improves plating film adhesion.
2Ease of manufacture
If selective plating is achieved through conventional methods, then the process becomes complex with multiple steps, but the patent seeks to simplify it
Solution Approach 1:
The desired pattern is pre-formed on the glass substrate through laser irradiation, creating a mask-like structure that guides subsequent catalyst application. This preliminary patterning eliminates the need for complex photolithography and etching steps, simplifying the overall manufacturing process.
Solution Approach 2:
A catalyst layer is introduced as an intermediary substance that selectively deposits plating metal only on laser-irradiated areas. This intermediary approach enables precise pattern transfer without requiring complex direct deposition equipment or multi-step processes.
3Manufacturing precision
If special glass substrates are used for laser irradiation, then selective plating can be achieved, but the substrate cost increases
Solution Approach 1:
The method is designed to work with conventional, inexpensive glass substrates rather than requiring special substrates. The laser parameters and process conditions are optimized to achieve precise patterning on standard glass, making the technology universally applicable and cost-effective.
Solution Approach 2:
The laser irradiation parameters (wavelength, pulse duration, power density) are optimized to match the properties of conventional glass substrates, enabling precise selective plating without requiring expensive specialized materials. This parameter optimization achieves high precision with low-cost substrates.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method allows for the easy production of highly adherent plating film patterns on glass substrates without the need for special glass substrates, ensuring selective deposition only on irradiated areas, enhancing the mechanical strength and thermal stability of the plated articles.
Implementation Method 1
a first step of irradiating a partial area of the surface of the transparent glass substrate with a pulsed laser
Implementation Method 2
a second step of attaching an electroless plating catalyst on the surface of the transparent glass substrate
Implementation Method 3
a third step of selectively removing the catalyst attached to the area unirradiated by the pulsed laser in the transparent glass substrate
Implementation Method 4
a fourth step of electroless plating the transparent glass substrate after the third step to selectively form a plating film in the irradiated area with the pulsed laser
Data Source
Figure 1~3
Figure 4~5
AI summary
There is provided a method for producing a plated article in which a plating film pattern is formed on the surface of a glass substrate, comprising a first step of irradiating a partial area of the surface of the glass substrate with a pulsed laser; a second step of attaching an electroless catalyst on the surface of the glass substrate; a third step of selectively deactivating or selectively removing the catalyst attached to the unirradiated area with the pulsed laser in the glass substrate; and a fourth step of nonelectrolytically plating the glass substrate after the third step to selectively form a plating film in the irradiated area with the pulsed laser. The method allows for easily producing a plated article in which a highly adherent plating film pattern is formed on the surface of the glass substrate.