Pulsed Plasma Deposition Device Electron Beam Transport
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Solution Overview
Problem
Pulsed plasma deposition devices face inefficiencies in energy transfer to electron beams, leading to short deposition times, uneven film distribution, and capillary tube contamination, which reduces device lifetime.
Innovation Solution
A pulsed plasma deposition device with a transportation and focusing group that inclines the electron beam to focus it onto a small target area, preventing capillary contamination and ensuring symmetrical plasma plume propagation, thereby increasing energy density and deposition uniformity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Duration of action of moving object
If the electron beam is generated through channel spark discharge with background plasma, then the charges are neutralized and the beam can be transported, but the thermal expansion of plasma shortens the anode-cathode distance and limits beam generation to only the discharge transition stage
Solution Approach 1:
The patent applies preliminary action by creating the electron beam during the discharge transition stage before thermal expansion occurs, and by pre-positioning the capillary tube at an inclined angle to optimize beam transport path. The beam is extracted and transported during the brief window when plasma has not yet expanded significantly, thus utilizing the transient favorable condition before temperature-driven degradation occurs.
2Speed
If the capillary tube is inclined to direct the plasma plume towards the substrate, then the plume can reach the substrate, but shading phenomena occur and material distribution becomes uneven
Solution Approach 1:
The patent applies asymmetry by deliberately inclining the capillary tube at a specific angle (30-60 degrees) relative to the target surface normal. This asymmetric configuration allows the electron beam to exit the capillary and travel along an optimized path that avoids direct interference with the plasma plume's symmetric expansion toward the substrate, thereby reducing shading effects while maintaining plume propagation speed.
3Ease of operation
If the capillary tube is used to transport the electron beam, then the beam can be directed towards the target, but ablated material penetrates and covers the capillary tube, disturbing operation and limiting device lifetime
Solution Approach 1:
The patent applies the extraction principle by removing the capillary tube from the direct path of ablated material. The capillary is inclined at an angle that directs the electron beam toward the target while allowing the plasma plume and ablated material to pass by without penetrating into the capillary. This spatial separation extracts the harmful contamination effect from the beam transport function, preserving capillary lifetime while maintaining operational capability.
4Power
If high voltage is applied to generate plasma in the hollow cathode, then electrons are extracted and accelerated towards the target, but only a small part of the initial energy is transferred to energetic electrons during normal channel spark discharge
Solution Approach 1:
The patent applies dynamics by operating in the discharge transition stage rather than steady-state normal discharge. During this dynamic transient phase, plasma conditions are rapidly changing before thermal equilibrium is reached, allowing more efficient energy transfer to electrons. The system exploits this dynamic window where energy distribution is more favorable for electron acceleration, increasing the fraction of initial energy that reaches the beam.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution enhances energy transfer efficiency, extends device lifetime, and achieves high-speed, uniform film deposition with improved composition matching the target material, similar to pulsed laser ablation.
Implementation Method 1
The ablation process is activated by the high amount of energy rapidly transferred onto the surface of the solid target by the electron beam generated by the pulsed plasma deposition device
Implementation Method 2
a high voltage of negative polarity applied to the cathode causes the formation of plasma inside the cathode with the help of the activation electrode
Implementation Method 3
the potential difference established with respect to the anode allows the electrons to be accelerated along the tubular element itself towards the target
Implementation Method 4
A pulsed plasma deposition device with a transportation and focusing group that inclines the electron beam to focus it onto a small target area, preventing capillary contamination and ensuring symmetrical plasma plume propagation, thereby increasing energy density
Implementation Method 5
The ablated material, in the plasma state, the so-called plume, propagates towards the substrate where it condenses in the form of a thin film
Data Source
AI summary
A pulsed plasma deposition device, comprising an apparatus for generating a beam of electrons (3), a target (4) and a substrate (6), the apparatus (3) being suitable for generating a pulsed beam of electrons directed towards said target (4) to determine the ablation of the material of said target (4) in the form of a plasma plume (19) directed towards said substrate (6); the device comprises a transportation and focussing group (13) of the beam of electrons towards said target (4), arranged between said apparatus (3) and said target (4) and comprising a transportation cone (14), the transportation and focussing group (13) also comprising a focussing electrode (15) directly connected to the transportation cone (14) and shaped substantially like a loop; the axis of symmetry (16) of the focussing electrode (15) is perpendicular, or substantially perpendicular, to the surface of the target (4).