Pulsed Valve Pressure Control for Process Chambers
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Solution Overview
Problem
Existing pressure control systems for process chambers are bulky, expensive, and unsuitable for applications requiring continuous gas inflow and outflow, as they rely on large and costly valves like slit valves and butterfly valves.
Innovation Solution
A pressure control system utilizing a pulsed valve controlled by a programmable logic controller, which adjusts its pulse rate based on pressure differences between the process chamber and a programmed setpoint, ensuring continuous gas inflow and outflow while maintaining optimal pressure through varying the open and closed times of the pulsed valve.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If traditional valves (slit valves, butterfly valves) are used for pressure control, then pressure stability is maintained, but the system becomes bulky, expensive, and occupies large space
Solution Approach 1:
The patent applies periodic action by using a pulsed valve that opens and closes at controlled intervals to regulate pressure. Instead of using a traditional valve that remains partially open, the system uses rapid periodic opening and closing actions to achieve pressure control with a compact component
Solution Approach 2:
The patent replaces the mechanical system of traditional valves (slit valves, butterfly valves) with a electronically controlled pulsed valve system. The valve is actuated by electrical signals from a controller based on pressure feedback, substituting continuous mechanical adjustment with periodic electrical actuation
2Reliability
If traditional valves are used for pressure control, then pressure regulation is achieved, but the system cost increases
Solution Approach 1:
The patent employs a simpler, more economical valve design that can be rapidly actuated. The pulsed valve system uses off-the-shelf components (valve body, solenoid actuator, controller) rather than expensive specialized valves, reducing overall system cost while maintaining pressure control functionality
3Area of stationary object
If a pulsed valve is used instead of traditional valves, then device size and cost are reduced, but pressure control precision must be maintained
Solution Approach 1:
The patent implements feedback control by continuously monitoring pressure with a pressure sensor and adjusting the pulsed valve operation based on the difference between measured and target pressure. The controller modifies pulse frequency and duration dynamically to maintain precise pressure control
Solution Approach 2:
The patent applies dynamics by making the valve operation adaptive and variable. The pulse frequency, duration, and timing are dynamically adjusted based on real-time pressure conditions, allowing the system to respond to changing pressure requirements and maintain precision across different operating conditions
Data Source
Figure 1
AI summary
A method of and apparatus for controlling pressure in a process chamber having a continuous gas inlet flow and a continuous gas outlet flow comprising providing a pulsed valve at a gas outlet, a pressure gauge, and a programmable controller and varying the pulse rate of the pulsed valve, wherein either the open time or closed time, or both open and closed times, is lengthened or shortened, depending on whether the gauge pressure is above or below the programmed setpoint.