Pump Backstream Isolation for Fast Valve Closure in Fab Equipment
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Solution Overview
Problem
Existing pump backstream prevention structures for semiconductor fabrication equipment suffer from a time delay between pump malfunction detection and isolation valve closure, leading to potential contamination of process chambers with particles.
Innovation Solution
A real-time monitoring system using sensors to detect dry pump operation parameters and a control unit that controls an isolation air supply pipe to immediately close the pumping pipe upon detecting a malfunction, reducing the time delay and preventing backstream contamination.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Loss of time
If the isolation valve is controlled by a controller of semiconductor fabrication equipment, then the system structure is simple, but a time delay occurs between pump malfunction detection and valve closure
Solution Approach 1:
A sensor is introduced as an intermediary component between the pump and the isolation valve. The sensor directly detects pump malfunction and immediately actuates the isolation valve without requiring signal transmission through the main controller, thereby eliminating the time delay while maintaining system simplicity through modular addition
Solution Approach 2:
The isolation valve is pre-positioned and pre-charged with actuation capability through the sensor system. When malfunction is detected, the valve is already in position to close immediately, performing the protective action in advance preparation rather than reacting through multi-step controller processing
2Object-affected harmful factors
If the isolation valve closes after a time delay, then the control system operates normally, but particles backstream into the process chamber causing contamination
Solution Approach 1:
The sensor-isolation valve system performs preliminary anti-action by being pre-configured to immediately counteract pump malfunction. The sensor continuously monitors pump operation and has direct actuation capability on the isolation valve, creating a preemptive protective mechanism that prevents particle backstream before it can occur
Solution Approach 2:
The sensor serves as a dedicated intermediary that directly connects pump status to isolation valve actuation, bypassing the main controller's processing delay. This intermediary pathway ensures immediate response to malfunctions, preventing particle contamination by closing the valve before backstream can occur
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively reduces the time delay between pump malfunction and isolation valve closure, preventing particle backstream into the process chamber and minimizing contamination, thus maintaining a cleaner environment for semiconductor fabrication.
Implementation Method 1
a sensor that detects, in real time, at least one of a detection current value for operation of the dry pump, a detection voltage value for operation of the dry pump, and the number of revolutions of a rotor of the dry pump
Implementation Method 2
an isolation air supply pipe that supplies air externally to the isolation valve so that the pumping pipe is opened by the isolation valve
Data Source
AI summary
Provided is a pump backstream prevention structure for semiconductor fabrication equipment, including a sensor, an isolation air supply pipe, and a control unit. A time delay from a point in time at which the dry pump starts to malfunction to a point in time at which the isolation valve is closed is reduced, compared to a method of closing the isolation valve by a controller of the semiconductor fabrication equipment. Accordingly, a backstream in which particles move from the pumping pipe to the process chamber before the closing of the isolation valve is prevented.