Pumping Ring Baffles for Symmetrical Exhaust in Substrate Chambers
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
In substrate processing chambers, asymmetrical evacuation of fluids during or after processing operations leads to non-uniform processing and residue formation, causing defects in substrates, while efforts to improve symmetry result in decreased pumping exhaust flow rates and design limitations.
Innovation Solution
A pumping ring with a body featuring an upper and lower wall, inner and outer radial walls, and an annulus, including first and second exhaust ports and baffles, is used to facilitate symmetrical fluid exhaustion by directing gases through angled openings and conduits, ensuring equal flow path lengths and reducing pressure gradients.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Stability of the object's composition
If efforts are made to make fluid evacuation more symmetrical, then symmetry of exhaust operations is improved, but pumping exhaust flow rates decrease
Solution Approach 1:
The pumping ring is divided into multiple segments with individual exhaust ports and baffles. Each segment independently manages fluid evacuation from different regions of the substrate processing chamber, allowing symmetrical exhaust operations while maintaining high flow rates through parallel evacuation paths
Solution Approach 2:
Different regions of the pumping ring are designed with locally optimized exhaust ports and baffles tailored to the specific fluid evacuation needs of each chamber region. This ensures symmetrical overall performance while allowing high flow rates in each local area
2Stability of the object's composition
If efforts are made to make fluid evacuation more symmetrical, then symmetry of exhaust operations is improved, but design flexibility is limited by other components
Solution Approach 1:
The pumping ring is segmented into modular units with standardized interfaces, allowing symmetrical exhaust operations while providing flexibility to adapt the overall configuration to different chamber component arrangements and sizes
Solution Approach 2:
The pumping ring design incorporates universal features that can accommodate various substrate processing chamber configurations. The modular segmented structure allows the same basic design to be adapted to different chamber sizes and component arrangements while maintaining symmetrical exhaust performance
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration achieves symmetrical exhaustion of fluids, reduces substrate defects, increases throughput, and maintains high pumping capacity by ensuring uniform fluid flow and equal flow path lengths, similar to systems with multiple exhaust ports.
Implementation Method 1
a first baffle disposed in the annulus adjacent to the first exhaust port, and a second baffle disposed in the annulus adjacent to the second exhaust port
Implementation Method 2
ensuring equal flow path lengths and reducing pressure gradients
Data Source
AI summary
The present disclosure relates to pumping devices, components thereof, and methods associated therewith for substrate processing chambers. In one example, a pumping ring for substrate processing chambers includes a body. The body includes an upper wall, a lower wall, an inner radial wall, and an outer radial wall. The pumping ring also includes an annulus defined by the upper wall, the lower wall, the inner radial wall, and the outer radial wall. The pumping ring also includes a first exhaust port in the body that is fluidly coupled to the annulus, and a second exhaust port in the body that is fluidly coupled to the annulus. The pumping ring also includes a first baffle disposed in the annulus adjacent to the first exhaust port, and a second baffle disposed in the annulus adjacent to the second exhaust port.