Surrogate Model Optimizer for Purge Flow Uniformity
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Solution Overview
Problem
Conventional processing chambers face challenges in controlling non-concentric purge regions, leading to uneven azimuthal and thickness uniformity in deposition processes due to uncontrolled pressure and flow parameters, which affects separation and thermal uniformity between processing stations.
Innovation Solution
A surrogate model-based optimizer is developed to determine and control flow and pressure parameters of non-concentric purges using detailed physics models and machine learning techniques, calibrating simulation models against experimental data to optimize purge flow and pressure settings, thereby improving uniformity and preventing cross-contamination.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If non-concentric purge regions are used to isolate processing stations, then separation between stations is improved, but azimuthal uniformity and thickness uniformity deteriorate due to uncontrolled pressure and flow parameters
Solution Approach 1:
The patent applies parameter changes by dynamically adjusting pressure and flow rate parameters of non-concentric purge regions based on machine learning model predictions. The system modifies purge flow rates and pressures to achieve both effective station isolation and improved azimuthal/thickness uniformity, resolving the contradiction between separation reliability and manufacturing precision.
Solution Approach 2:
The patent implements feedback control through machine learning models that predict the impact of purge parameters on deposition uniformity. The system uses simulated and experimental data to create surrogate models that provide real-time feedback on optimal purge settings, enabling continuous adjustment to maintain both separation effectiveness and uniformity requirements.
2Manufacturing precision
If conventional process recipes control concentric purge regions, then deposition process control is improved, but non-concentric purge regions remain uncontrolled affecting thermal uniformity
Solution Approach 1:
The patent applies universality by creating a unified control system that manages both concentric and non-concentric purge regions through a single machine learning-based platform. The surrogate models handle multiple purge region types simultaneously, enabling coordinated control of both deposition process parameters and thermal uniformity across the chamber.
Solution Approach 2:
The patent introduces machine learning surrogate models as intermediaries between conventional process recipes and purge region control. These models translate process requirements into optimized purge parameters for both concentric and non-concentric regions, mediating the control relationship to achieve improved thermal uniformity while maintaining deposition process precision.
3Measurement precision
If detailed physics models are used to simulate chamber behavior, then prediction accuracy is improved, but computational complexity and time increase
Solution Approach 1:
The patent applies preliminary action by pre-computing simulation data across a range of operating conditions before actual processing. Design of experiments is performed in advance to generate training datasets, and machine learning surrogate models are built beforehand to replace time-consuming detailed physics simulations during real-time operation, significantly reducing computational time while maintaining prediction accuracy.
Solution Approach 2:
The patent creates simplified copies of detailed physics models through machine learning surrogate models. These surrogate models replicate the behavior of complex physics-based simulations but execute much faster, enabling real-time optimization and control decisions without the computational burden of full physics model execution.
Data Source
AI summary
Methods, software systems and processes to develop surrogate model-based optimizers for controlling and optimizing flow and pressure of purges between a showerhead and a heater having a substrate support to control non-uniformity inherent in a processing chamber due to geometric configuration and process regimes. The flow optimizer process utilizes experimental data from optimal process space coverage models, generated simulation data and statistical machine learning tools (i.e. regression models and global optimizers) to predict optimal flow rates for any user-specified process regime.


