Photovoltaic Module Oxide Barrier Film for PID Resistance

The patent employs a composite film structure consisting of a first film containing metal oxides (such as aluminum oxide, zinc oxide, or calcium oxide) and/or silicon oxides, and optionally a second film containing metal oxides. This composite material approach combines different oxide materials to achieve synergistic effects in blocking alkali metal ion migration while maintaining PID resistance. The composite structure allows optimization of both protective performance and structural simplicity.

The first film containing metal oxides and/or silicon oxides is applied in advance to the glass panel surface before assembling the photovoltaic module. This preliminary action ensures that the protective film is already in place to prevent alkali metal ion migration from the glass to the cell string during module operation. The film can be deposited using conventional techniques such as sputtering, chemical vapor deposition, or sol-gel methods, integrating smoothly into existing manufacturing workflows.

The patent utilizes metal oxides and silicon oxides that form chemical bonds with high bond energy and high stability, specifically metal-oxygen and silicon-oxygen bonds. By selecting materials with appropriate bond energies (typically greater than 400 kJ/mol), the film effectively blocks the migration of alkali metal ions while maintaining compatibility with standard photovoltaic module manufacturing processes. Common metal oxides include aluminum oxide, zinc oxide, and calcium oxide, all of which form stable bonds that prevent ion migration.