Polyvinyl Alcohol Wetting Agent Mixing to Suppress Aggregates

Resolve Bottlenecks,
Find Innovative Solutions
Generate Solutions

Solution Overview

Problem

Aqueous polyvinyl alcohol solutions used in semiconductor wetting agents and polishing compositions often form aggregates, leading to reduced productivity due to poor filtration ability and increased time for solid removal.

Innovation Solution

A method for producing a polyvinyl alcohol composition through an addition-in-liquid step, where a second liquid is added into a first liquid containing polyvinyl alcohol and water, minimizing aggregate formation and enhancing filtration ability.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Speed

If polyvinyl alcohol is dissolved in water by high-temperature agitation, then dissolution speed is improved, but aggregate formation increases

Engineering Contradiction:
Improvedissolution speedVSAvoidaggregate formation
Core Design Contradiction:
SpeedVSStability of the object's composition

Solution Approach 1:

The patent applies preliminary action by dispersing polyvinyl alcohol particles in water before heating, creating a pre-dispersed state that prevents aggregate formation during subsequent dissolution. The dispersion step prepares the system in advance so that when heating occurs, particles are already separated and can dissolve uniformly without coalescing into aggregates.

Inventive Principle:
Principle #10Preliminary action

2Adaptability or versatility

If aqueous polyvinyl alcohol solution is mixed with other aqueous solutions, then application versatility is improved, but aggregate formation increases

Engineering Contradiction:
Improveapplication versatilityVSAvoidaggregate formation
Core Design Contradiction:
Adaptability or versatilityVSStability of the object's composition

Solution Approach 1:

The patent applies parameter changes by controlling the temperature and addition rate when mixing aqueous polyvinyl alcohol solution with other aqueous solutions. By maintaining appropriate temperature parameters and controlling the rate of mixing, the patent prevents aggregate formation while still allowing versatile applications. The parameters of temperature, concentration, and mixing speed are adjusted to maintain solution stability during combination with other solutions.

Inventive Principle:
Principle #35Parameter changes

3Manufacturing precision

If aggregate is removed by filtration, then product purity is improved, but productivity decreases

Engineering Contradiction:
Improveproduct purityVSAvoidfiltration time
Core Design Contradiction:
Manufacturing precisionVSProductivity

Solution Approach 1:

The patent applies preliminary anti-action by preventing aggregate formation in the first place through proper dispersion and controlled heating processes. By taking preventive measures during the dissolution and mixing stages, the patent eliminates the need for extensive filtration later, thereby maintaining high product purity while avoiding productivity loss from time-consuming filtration operations.

Inventive Principle:
Principle #9Preliminary anti-action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The method results in a polyvinyl alcohol composition with reduced aggregate generation, improved filtration ability, and excellent storage stability, suitable for semiconductor wetting agents and polishing compositions.

Implementation Method 1

adding into the inside of any one liquid of a first liquid containing polyvinyl alcohol and water and a second liquid other than the first liquid, the other liquid of the first liquid and the second liquid

Methodology Applied
Scientific EffectBubble formation prevention:

Data Source

PatentUS12624172B2Method for producing wetting agent for semiconductor, containing polyvinyl alcohol composition, polishing composition containing wetting agent for semiconductor, obtained by the production method, and method for producing polishing composition
Publication Date: 2026.05.12 FUJIMI INCORPORATED
  • US12624172B2 patent drawing

AI summary

To provide a polyvinyl alcohol composition effectively suppressed in generation of an aggregated product, in a method for producing a wetting agent for a semiconductor, containing a polyvinyl alcohol composition.A method for producing a wetting agent for a semiconductor, containing a polyvinyl alcohol composition, wherein the polyvinyl alcohol composition is obtained through an addition-in-liquid step of adding into the inside of any one solution of a first liquid containing polyvinyl alcohol and water and a second liquid other than the first liquid, the other liquid of the first liquid and the second liquid.