PVD Coating Uniformity via Tunable Mask and Optical Monitoring

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Solution Overview

Problem

Maintaining uniformity of coating thickness in physical vapor deposition (PVD) processes is challenging due to the time-consuming and inconsistent preparation of shielding masks, which requires frequent adjustments and lacks real-time monitoring for optimal results.

Innovation Solution

A Uniformity Management System (UMS) incorporating a multi-channel optical monitoring system and uniformity control system that uses tunable masks to adjust deposition rates and ensure uniformity by determining layer endings and applying appropriate masks for each surface area, allowing for real-time feedback and adjustments during the deposition process.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If shielding masks are manually prepared with different shapes to achieve coating uniformity, then coating uniformity can be improved, but the preparation time and complexity increase significantly

Engineering Contradiction:
Improvecoating uniformityVSAvoidmask preparation time
Core Design Contradiction:
Manufacturing precisionVSLoss of time

Solution Approach 1:

The patent employs adjustable and reconfigurable mask systems that can be dynamically modified during the coating process. Instead of preparing multiple fixed masks, the system allows real-time adjustment of mask shapes and positions to optimize coating uniformity for different substrate geometries and coating requirements.

Inventive Principle:
Principle #15Dynamics

Solution Approach 2:

The invention utilizes controllable parameters such as mask position, shape, and material properties that can be adjusted during the coating process. By changing these parameters dynamically, the system achieves optimal coating uniformity without requiring manual preparation of multiple different masks.

Inventive Principle:
Principle #35Parameter changes

2Manufacturing precision

If multiple shielding masks with different shapes are prepared to achieve best uniformity results, then coating uniformity improves, but the device complexity and cost increase

Engineering Contradiction:
Improvecoating uniformityVSAvoidmask system complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent implements a universal mask system that can perform multiple functions through adjustment and reconfiguration. A single mask system can serve different coating requirements by changing its position, shape, or configuration, eliminating the need for multiple specialized masks for different applications.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Solution Approach 2:

The adjustable and reconfigurable nature of the mask system allows it to adapt to various coating scenarios dynamically, providing a simplified yet versatile solution that maintains coating uniformity across different substrate types and coating processes.

Inventive Principle:
Principle #15Dynamics

3Manufacturing precision

If manual adjustment of mask shape is performed to optimize coating uniformity, then coating quality improves, but the ease of operation decreases

Engineering Contradiction:
Improvecoating uniformityVSAvoidmask adjustment convenience
Core Design Contradiction:
Manufacturing precisionVSEase of operation

Solution Approach 1:

The patent incorporates real-time monitoring systems that provide feedback on coating thickness and uniformity during the deposition process. This feedback enables automatic or guided adjustment of mask parameters to maintain optimal coating uniformity without requiring manual trial-and-error adjustments.

Inventive Principle:
Principle #23Feedback

Solution Approach 2:

The system includes automatic control mechanisms that can self-adjust mask positions and configurations based on real-time coating data, reducing the need for manual intervention and making the operation more convenient while maintaining high coating quality.

Inventive Principle:
Principle #25Self-service

4Manufacturing precision

If shielding masks are used to manage coating thickness, then coating uniformity can be maintained, but real-time monitoring capability is lacking

Engineering Contradiction:
Improvecoating thickness uniformityVSAvoidreal-time coating status information
Core Design Contradiction:
Manufacturing precisionVSLoss of information

Solution Approach 1:

The patent integrates optical monitoring systems that continuously measure coating thickness and provide real-time feedback during the deposition process. This enables dynamic adjustment of mask parameters and deposition conditions to maintain optimal coating uniformity throughout the process.

Inventive Principle:
Principle #23Feedback

Solution Approach 2:

The invention replaces purely mechanical mask systems with an integrated system that combines mechanical mask adjustment with optical monitoring and automated control. This substitution enables real-time information acquisition and automated decision-making for maintaining coating uniformity.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The UMS effectively maintains and controls coating uniformity by automatically judging layer endings, adjusting deposition rates, and selecting the right masks, enhancing reproducibility and reducing the need for manual adjustments, thereby improving the consistency and efficiency of the PVD coating process.

Implementation Method 1

making judgment on when the deposition of the first coating layer ends by using the data of laser transmission passing through the coating layer during the deposition process

Methodology Applied
Scientific EffectLaser transmission: Light

Data Source

PatentUS10138539B1Method of managing coating uniformity with an optical thickness monitoring system
Publication Date: 2018.11.27 CHENG SHIPING
  • US10138539B1 patent drawing
  • US10138539B1 patent drawing

AI summary

The subject matter of the invention is a method for managing the coating thickness on a substrate in a physical vapor deposition system. Said method is applied to the system that comprises a multi-beam laser monitoring system and a uniformity control system with a multi-mask set. Said method comprises steps of computing error function for transmission of laser passing through the coating layer, ceasing the deposition process based on the comparison between the error function and a predetermined constant, comparing deposition rates among all laser beams, identifying the area of the coating layer with a different deposition rate, adjusting the multi-mask set to modify the deposition rate on that coating area in the next deposition process, and resuming the deposition process for the next coating layer until uniformity of the coating thickness is reached.