PVD Crucible Positioning Marker for Distance Adjustment
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Solution Overview
Problem
Existing physical vapor deposition systems face challenges in accurately determining and adjusting the distance between the crucible and substrate during the deposition process, especially under processing conditions, due to difficulties in determining real distances and achieving homogeneous alignment, particularly when the process chamber is closed and at non-normal conditions.
Innovation Solution
A physical vapor deposition system equipped with a moving device and a positioning marker with a stepped contour, allowing for precise adjustment of the distance between the crucible and substrate, and enabling visual inspection through a viewport to ensure parallel alignment and correct positioning even during deposition.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If the distance between the crucible and substrate is manually adjusted, then the deposition uniformity can be optimized, but the process time increases and productivity decreases
Solution Approach 1:
Positioning markers are pre-installed on the crucible and substrate holder before the deposition process. These markers provide reference points that enable automatic positioning systems to quickly and accurately determine the optimal distance between crucible and substrate, eliminating the need for time-consuming manual adjustment while maintaining deposition uniformity.
Solution Approach 2:
The manual mechanical adjustment process is replaced with an automatic positioning system that uses positioning markers and sensors to determine and adjust the crucible-substrate distance. This substitution eliminates manual intervention, reduces process time, and maintains precision through automated control.
2Manufacturing precision
If complex positioning procedures are used to achieve accurate crucible-substrate distance, then deposition quality improves, but the ease of operation decreases
Solution Approach 1:
The positioning markers are designed to enable the system to self-position the crucible and substrate at the optimal distance. The markers provide inherent reference information that automatic positioning systems can use without requiring complex external positioning procedures, making the operation simpler while maintaining deposition quality.
Solution Approach 2:
The complex positioning procedures are extracted and replaced by a simplified marker-based positioning system. The positioning markers contain all necessary reference information, eliminating the need for complex external positioning procedures and making the system easier to operate while maintaining accuracy.
3Manufacturing precision
If manual positioning adjustment is performed, then deposition uniformity can be achieved, but the process becomes time-consuming
Solution Approach 1:
Positioning markers are pre-installed on the crucible and substrate holder before the deposition process. These markers provide reference points that enable automatic positioning systems to quickly and accurately determine the optimal distance between crucible and substrate, eliminating the need for time-consuming manual adjustment while maintaining deposition uniformity.
Solution Approach 2:
The manual mechanical adjustment process is replaced with an automatic positioning system that uses positioning markers and sensors to determine and adjust the crucible-substrate distance. This substitution eliminates manual intervention, reduces process time, and maintains precision through automated control.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables simple and precise adjustment of the distance between the crucible and substrate, ensuring homogeneous film deposition and accommodating varying process conditions, including temperature and pressure changes, while allowing for real-time visual inspection and control.
Implementation Method 1
at least one positioning marker is provided, which is arranged to reflect light from a light source
Implementation Method 2
Physical vapor deposition system comprising positioning marker and method for adjusting distance between crucible and substrate
Data Source
Figure 1~2
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AI summary
A physical vapor deposition system (1) comprises a crucible (10) for holding a source material (102), a substrate holder (20) for holding a substrate (4), and a moving device (6a, 6b) for moving the crucible (10) for the substrate holder (20). A method for adjusting distance between the crucible (10) and the substrate (4) in the physical vapor deposition system (1) is also presented.