PVD-Deposited Mesa Layers for Replaceable Substrate Supports
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Solution Overview
Problem
Substrate mesas on substrate supports wear down during processing, affecting processing performance and requiring frequent replacement or repair, which is costly and disrupts the critical distance between the substrate and electronics within the support.
Innovation Solution
Utilizing physical vapor deposition (PVD) to form mesas on substrate supports, allowing for repeated replacement and addition of new layers without affecting the buffer material between the RF mesh and mesas, thereby maintaining the critical distance and enhancing substrate support properties.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If traditional substrate supports with integrated mesas are used, then the support structure is simple and robust, but the mesas wear down during processing and must be frequently replaced or repaired
Solution Approach 1:
The substrate support is divided into separate components: a support body and a separate deposited layer containing the mesas. This segmentation allows the mesas to be replaced independently from the support body, extending the support life while maintaining structural integrity. The deposited layer can be removed and re-deposited without affecting the underlying support body.
Solution Approach 2:
The invention changes the material parameter of the mesas by using a deposited layer (such as metal or ceramic) instead of the original support body material. This parameter change allows the mesas to be re-deposited multiple times, transforming them from a permanent, wear-prone feature into a replaceable component that can be restored when worn.
2Reliability
If mesas are frequently replaced or repaired, then mesa durability is improved, but the critical distance between substrate and electronics is affected and processing performance deteriorates
Solution Approach 1:
The deposited layer acts as an intermediary between the support body and the substrate. When mesas wear down, instead of replacing the entire support structure, only the deposited layer needs to be removed and re-deposited. This intermediary layer can be precisely controlled during deposition to maintain the critical distance between the substrate and underlying electronics, ensuring processing precision is preserved.
Solution Approach 2:
The invention replaces mechanical wear of the support body with a depositable material layer. The deposited layer can be precisely applied using vapor deposition techniques, allowing for accurate control of thickness and position. This substitution enables maintenance of the critical geometric relationship without the imprecision associated with mechanical grinding or machining of the support body.
3Ease of repair
If the support body thickness is reduced to allow easier mesa replacement, then ease of repair is improved, but the structural strength and stability of the support deteriorates
Solution Approach 1:
By segmenting the support into a thick support body and a thin deposited layer, the invention allows the support body to maintain its structural strength while the deposited layer provides the wearable mesa features. The support body can be sufficiently thick to provide mechanical strength, while the deposited layer can be easily removed and re-deposited for mesa replacement without compromising the underlying support structure.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Enables near-unlimited mesa replacement, reducing the cost of ownership and minimizing issues like backside scratching and deposition uniformity loss by maintaining the necessary distance from the RF mesh, thus optimizing processing performance.
Implementation Method 1
Utilizing physical vapor deposition (PVD) to form mesas on substrate supports
Data Source
AI summary
Embodiments of the present disclosure generally relate to forming mesas on substrate supports. In some embodiments, the substrate supports include heaters or electrostatic chucks. More specifically, embodiments relate to using physical vapor deposition (PVD) to reform damaged mesas on substrate supports by adding new layers of material. In one embodiment, a method of forming features on a substrate support is provided. The method includes depositing a first layer on a first surface of a support body of a substrate support. The method further includes forming a plurality of features in the first layer by removing portions of the first layer. The plurality of features include a plurality of valleys between a plurality of peaks. A ratio of a thickness of the support body to a thickness of the first layer is greater than 10:1.