PVD Shield Gas Distribution Vents for Uniform Deposition

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Solution Overview

Problem

In physical vapor deposition (PVD) chambers, achieving uniform distribution of process gases is challenging due to indirect gas introduction methods, which can lead to non-uniform film properties and deposition rates.

Innovation Solution

A shield with an annular one-piece body and gas distribution vents is used in conjunction with a gas injection adapter to ensure direct and uniform gas injection into the PVD chamber, improving gas distribution and deposition uniformity.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If indirect gas introduction around shields is used, then the chamber structure is simple, but gas distribution uniformity deteriorates

Engineering Contradiction:

Improvegas distribution uniformityVSAvoidgas injection system complexity

Core Design Contradiction:

Manufacturing precisionVSDevice complexity

Solution Approach 1:

The gas injection system is segmented into multiple gas distribution vents positioned at different locations (top, bottom, and side walls of the shield) to distribute gas uniformly throughout the chamber. Each vent acts as an independent gas introduction point, transforming a single indirect injection point into multiple distributed injection points for improved uniformity.

Inventive Principle:

Principle #1Segmentation

Solution Approach 2:

The shield itself serves as an intermediary structure that incorporates gas distribution vents. Instead of introducing gas indirectly around the shield, the shield becomes the medium through which gas is directly distributed into the deposition region, improving both uniformity and deposition rate.

Inventive Principle:

Principle #24Intermediary (Mediator)

2Productivity

If indirect gas introduction is used, then the apparatus structure is simple, but deposition rate decreases

Engineering Contradiction:

Improvedeposition rateVSAvoidshield structure complexity

Core Design Contradiction:

ProductivityVSDevice complexity

Solution Approach 1:

The gas distribution function is merged with the shield structure. The shield is designed with integrated gas distribution vents, combining the protective function of the shield with the gas distribution function, thereby increasing deposition rate without adding separate complex gas injection components.

Inventive Principle:

Principle #5Merging (Combining)

Solution Approach 2:

Gas is introduced through vents positioned to distribute reactant gas into the deposition region before the actual deposition process begins. This preliminary gas distribution ensures optimal gas concentration and uniformity are achieved at the start of deposition, maximizing deposition rate from the beginning.

Inventive Principle:

Principle #10Preliminary action

3Manufacturing precision

If indirect gas introduction around shields is used, then installation is simple, but film property uniformity deteriorates

Engineering Contradiction:

Improvefilm thickness uniformityVSAvoidgas injection operation

Core Design Contradiction:

Manufacturing precisionVSEase of operation

Solution Approach 1:

Different regions of the shield are equipped with gas distribution vents of different configurations (top vents, bottom vents, side wall vents) to provide locally optimized gas distribution. Each local region receives appropriate gas flow to ensure uniform film properties across the entire substrate surface.

Inventive Principle:

Principle #3Local quality

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This solution enhances the uniformity of gas distribution and deposition rates, increasing the deposition rate to about 10 angstroms/second while maintaining high ionization levels and structural integrity of the chamber.

Implementation Method 1

a plurality of gas distribution vents disposed along the annular feature and formed through the one-piece body, wherein the plurality of gas distribution vents are spaced apart from each other to distribute gases into the inner volume in a desired pattern

Methodology Applied

Scientific EffectGas distribution through vents:

Implementation Method 2

In a physical vapor deposition (PVD) chamber, uniform distribution of process gases within a closed process chamber is desired during the deposition process

Methodology Applied

Scientific EffectPhysical vapor deposition: Physical Vapour Deposition

Data Source

PatentUS9957601B2Apparatus for gas injection in a physical vapor deposition chamber

Publication Date: 2018.05.01 APPLIED MATERIALS INC

AI summary

Apparatus for physical vapor deposition are provided herein. In some embodiments, a shield for use in a physical vapor deposition chamber, comprises an annular one-piece body having an inner volume, a top opening and a bottom opening, wherein a bottom of the annular one-piece body includes an inner upwardly extending u-shaped portion, an annular groove formed in an inner wall of the one-piece body, and a plurality of gas distribution vents disposed along the annular feature and formed through the one-piece body, wherein the plurality of gas distribution vents are spaced apart from each other to distribute gases into the inner volume in a desired pattern.