PVD Shutter Intermediate Position for Coating Uniformity
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Solution Overview
Problem
Existing physical vapor deposition machines lack flexibility in coating multiple substrates efficiently and suffer from uneven coating distribution due to limited carousel capacity and concentric arrangement, which results in inconsistent coating features across substrates.
Innovation Solution
A physical vapor deposition machine with a movable shutter system that allows for three positions: fully on, fully off, and an intermediate position, enabling precise control over the coating area, and a carrousel configuration that allows for concentric rows of substrates, with a mask for additional control, to manage coating distribution effectively.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If a two-position shutter system is used, then the structure is simple and easy to operate, but the flexibility in controlling coating distribution is insufficient
Solution Approach 1:
The shutter system is segmented into multiple independent screens (first screen, second screen, third screen) that can be positioned separately. Each screen can be independently adjusted to create different coating patterns, allowing precise control over which areas of the substrates receive coating material without requiring a completely complex system redesign.
Solution Approach 2:
The shutter system transitions from a static two-position design to a dynamic multi-position system where screens can be moved between fully retracted, fully extended, and intermediate positions. This dynamic capability allows the system to adapt to different coating requirements while maintaining a relatively simple mechanical structure.
2Productivity
If substrates are arranged in concentric circles on the carousel, then the maximum number of substrates can be coated in each operation cycle, but uneven coating distribution occurs between central and peripheral substrates
Solution Approach 1:
The shutter system applies different local qualities to different areas of the substrates. By selectively positioning the screens, the system can allow coating material to reach central substrates while blocking peripheral substrates, or vice versa, or create gradient coating patterns. This local control mechanism enables uniform coating distribution across all substrates regardless of their position on the carousel.
3Manufacturing precision
If the shutter is positioned to coat all substrates, then productivity is maximized, but coating uniformity across different substrate positions deteriorates
Solution Approach 1:
The shutter system can be positioned to provide partial coating action on specific areas or substrates rather than attempting to coat all substrates uniformly. By using intermediate positions of the screens, the system applies coating material only where needed, achieving uniform coating quality on the targeted substrates while maintaining efficient use of coating material and process time.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution increases the number of substrates that can be coated efficiently while ensuring uniform coating distribution, adapting to the position, orientation, and shape of the substrates, and can utilize existing shutters to reduce costs.
Implementation Method 1
a target consisting of a material is bombarded with an energy beam provided by an electron beam gun. The energy beam causes atoms from the target to transform into the gaseous phase
Implementation Method 2
The energy beam causes atoms from the target to transform into the gaseous phase
Implementation Method 3
Vapor deposition machine may also comprise a thermal evaporator to provide a topcoat to the substrates
Implementation Method 4
The physical vapor deposition machine may also comprise an ion gun for providing a flow of ions towards the plurality of substrates, e.g. for densification of a layer or for activating a surface of the substrate before depositing a coating
Implementation Method 5
Physical Vapor Deposition is a well-known process performed under vacuum... These atoms then precipitate into solid form, coating one substrate or simultaneously a plurality of substrates in a vacuum container with a layer of the material
Data Source
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AI summary
The invention concerns a physical vapor deposition machine for depositing a coating onto at least one article, comprising: - at least one vaporization means and/or at least one ion gun configured to generate a flow of ions or vaporized material towards a carrousel configured to receive a plurality of articles, - at least one shutter of said flow of ions or vaporized material comprising at least one screen movable between a first and a second positions, said at least one shutter of said flow of ions or vaporized material is configured to be positioned and locked at at least one intermediate position between said first and second positions, wherein said at least one screen prevents a predetermined area projected onto said carrousel to be reached by said flow of ions or vaporized material when said shutter is in said at least one intermediate position.