Self-Centering Vacuum Seal for PVD Sputter Leakage and Arcing

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Solution Overview

Problem

Existing vacuum seal systems in PVD sputter applications suffer from leakage, arcing events, oxidation, nodule formation, degradation, abrasion, and particle generation due to O-rings and vent slots, leading to unreliable vacuum integrity and system failure.

Innovation Solution

A vacuum seal system comprising a compressible sealing ring with protrusions and recesses, a rigid portion, and a removable plasma shield, which forms a self-centering seal without O-rings or vent slots, providing a buffer between the sputtering target and isolation ring, and incorporating a plasma shield for protection.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If traditional O-ring and groove seal systems are used in PVD sputter applications, then the sealing structure is simple and easy to manufacture, but the system suffers from leakage, arcing events, oxidation, nodule formation, degradation, abrasion, and particle generation leading to unreliable vacuum integrity

Engineering Contradiction:
Improvevacuum integrityVSAvoidseal system structure
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The patent removes the traditional O-ring and groove components from the seal system. By extracting these problematic elements, the invention eliminates the sources of leakage, arcing, and particle generation while maintaining sealing functionality through an alternative flat surface contact mechanism between the sputtering target flange and the vacuum chamber

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The seal system is divided into distinct functional zones: a sealed zone with flat surface contact between the sputtering target flange and vacuum chamber, and a vent zone with slots or scallops that allow controlled gas flow. This segmentation enables the system to maintain vacuum integrity in critical areas while providing controlled venting where needed

Inventive Principle:
Principle #1Segmentation

2Adaptability or versatility

If vent slots or scallops are incorporated into the sputtering target flange, then gas venting is improved, but leakage, arcing events, and particle generation occur compromising vacuum integrity

Engineering Contradiction:
Improvegas venting capabilityVSAvoidvacuum integrity
Core Design Contradiction:
Adaptability or versatilityVSReliability

Solution Approach 1:

The vent slots or scallops are strategically positioned in specific local regions of the sputtering target flange where they provide necessary gas venting without compromising the overall sealing surface. This localized venting approach allows gas escape while maintaining vacuum integrity in the critical sealing zones

Inventive Principle:
Principle #3Local quality

3Ease of repair

If a dynamic vacuum seal system without O-rings is implemented, then maintenance and replacement are simplified, but the sealing mechanism becomes more complex requiring precise compression control

Engineering Contradiction:
Improveseal replacementVSAvoidseal compression control
Core Design Contradiction:
Ease of repairVSManufacturing precision

Solution Approach 1:

The seal system is designed to be self-regulating through the compressible material's inherent properties. The material automatically adjusts its compression level based on the mechanical interface between the sputtering target flange and vacuum chamber, eliminating the need for manual adjustment or precise pre-compression settings during assembly

Inventive Principle:
Principle #25Self-service

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The system maintains vacuum integrity, prevents leakage and arcing, minimizes degradation, and ensures consistent sealing over the life of the sputtering target, enhancing the reliability and stability of PVD processes.

Implementation Method 1

The compressible portion may include two or more higher profile protrusions and two or more lower profile recesses that facilitate formation of a vacuum seal through compression by and between the isolation ring and the sputtering target

Methodology Applied
Scientific EffectCompression: Compression

Implementation Method 2

The seal may further include a removable and replaceable plasma shield that is attachable to a first end of the seal

Methodology Applied
Scientific EffectPlasma: Plasma

Data Source

PatentUS12387913B2Dynamic vacuum seal system for physical vapor deposition sputter applications
Publication Date: 2025.08.12 TOSOH SMD INC
  • US12387913B2 patent drawing
  • US12387913B2 patent drawing
  • US12387913B2 patent drawing

AI summary

Provided is a vacuum seal and seal system including a corresponding isolation ring and a corresponding sputtering target. The seal and seal system may be used in PVD sputter applications. The seal may include a compressible portion and a rigid portion. The compressible portion may include two or more higher profile protrusions and two or more lower profile recesses that facilitate formation of a vacuum seal through compression by and between the isolation ring and the sputtering target. The seal may further include a removable and replaceable plasma shield that is attachable to a first end of the seal. The seal may further include a rim on a second end that selectively couples with a corresponding step-out portion of the isolation ring. The sputtering target may have a continuous peripheral flange surface. In an embodiment, the seal and seal system is self-centering.