Pyrolytic Carbon Holder for SiC Film Cleaning
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Solution Overview
Problem
Existing film forming apparatuses face challenges in extending the lifespan of members and improving cleaning efficiency when forming silicon carbide (SiC) films, as conventional methods either generate dust, consume excessive fluorine-containing gases, or fail to sufficiently remove reaction products, leading to poor workability and shortened lifespans.
Innovation Solution
A film forming method and apparatus that utilize a holder with a surface formed by pyrolytic carbon, which is resistant to fluorine-containing gases, allowing for efficient cleaning and extending the lifespan of members by using a fluorine-containing gas like ClF3 for removing reaction products while minimizing consumption and damage to upstream components.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Duration of action of stationary object
If a conventional holder with SiC coating is used for forming SiC films, then the film formation process can proceed, but the holder lifespan is short and cleaning efficiency is poor due to dust generation and excessive fluorine gas consumption
Solution Approach 1:
The holder surface material is changed from SiC coating to pyrolytic carbon coating. This parameter change in material composition provides resistance to fluorine-containing gases during cleaning, preventing dust generation and extending holder lifespan while maintaining film formation capability
Solution Approach 2:
The holder employs a composite structure with pyrolytic carbon coating on the surface. This composite material combines the benefits of carbon's resistance to fluorine gases with the underlying holder structure, achieving both extended lifespan and reduced harmful emissions during cleaning operations
2Productivity
If fluorine-containing gas is supplied to remove reaction products from the apparatus, then cleaning effectiveness improves, but gas consumption increases and upstream components suffer damage
Solution Approach 1:
The pyrolytic carbon coating acts as an intermediary protective layer between the fluorine-containing cleaning gas and the holder substrate. This mediator allows the cleaning gas to effectively remove reaction products while the carbon coating absorbs the harmful effects, reducing gas consumption and preventing damage to upstream components
3Ease of operation
If the holder surface is made resistant to fluorine-containing gases, then cleaning efficiency improves and gas consumption decreases, but the holder material selection becomes more restricted
Solution Approach 1:
The holder is segmented into functional zones: the surface layer is specifically designed with pyrolytic carbon coating for fluorine gas resistance during cleaning, while the bulk structure can be made from appropriate materials for mechanical support and thermal management. This segmentation allows optimization of each zone for its specific function
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method effectively extends the lifespan of holders and improves cleaning efficiency by using pyrolytic carbon surfaces, reducing dust generation, and minimizing fluorine gas consumption, thereby reducing damage to upstream components and enhancing the quality of SiC film formation.
Implementation Method 1
a plate-shaped member having at least a surface formed by pyrolytic carbon into the processing container to place the plate-shaped member on the stage, and supplying a fluorine-containing gas into the processing container
Implementation Method 2
removing a reaction product, which has been adhered to a part other than the substrate to be processed during the forming the silicon carbide film, by loading a plate-shaped member having at least the surface formed by pyrolytic carbon into the processing container to place the plate-shaped member on the stage, and supplying a fluorine-containing gas into the processing container
Implementation Method 3
forming the silicon carbide film on the substrate to be processed by loading a holder that holds the substrate to be processed into a processing container of a film forming apparatus to place the holder on a stage, and supplying a raw material gas into the processing container
Data Source
AI summary
A film forming method of forming a silicon carbide film on a substrate to be processed includes: forming the silicon carbide film on the substrate to be processed by loading a holder that holds the substrate to be processed into a processing container of a film forming apparatus to place the holder on a stage, and supplying a raw material gas into the processing container; and removing a reaction product, which has been adhered to a part other than the substrate to be processed during the forming the silicon carbide film, by loading a plate-shaped member having at least a surface formed by pyrolytic carbon into the processing container to place the plate-shaped member on the stage, and supplying a fluorine-containing gas into the processing container.