Pyrometer Temperature Measurement Through Transparent Table
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Solution Overview
Problem
Existing substrate processing apparatuses face challenges in accurately measuring the temperature of moving substrates, particularly due to interference from background radiation and changes in emissivity caused by the growing coating, which affects the precision of temperature measurements.
Innovation Solution
A substrate processing apparatus with a rotatable table and pyrometers positioned to measure temperature from the unprocessed side of the substrate, utilizing transparent passages and mirrors to minimize interference, and potentially using multiple pyrometers for continuous monitoring and synchronization to improve measurement accuracy.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If pyrometers are used to measure substrate temperature, then temperature measurement capability is provided, but measurement precision deteriorates due to background radiation interference
Solution Approach 1:
The patent extracts and removes the harmful background radiation from the measurement path by positioning the pyrometer to measure through the transparent table from the opposite side, eliminating radiation from heaters and processing sources that would otherwise interfere with the measurement
Solution Approach 2:
The transparent table acts as an intermediary medium that allows thermal radiation from the substrate to pass through to the pyrometer while blocking and filtering out background radiation from processing sources, enabling accurate temperature measurement without direct line-of-sight interference
2Measurement precision
If pyrometers measure temperature from the processed side, then temperature can be monitored, but measurement precision deteriorates due to emissivity changes from growing coating
Solution Approach 1:
Instead of measuring from the conventional side where the coating grows and changes emissivity, the patent inverts the measurement approach by positioning the pyrometer on the opposite side of the transparent table, measuring through the table to detect radiation from the substrate's rear surface which maintains stable emissivity characteristics
3Reliability
If multiple pyrometers are used for continuous monitoring, then measurement reliability improves, but device complexity increases
Solution Approach 1:
The transparent table serves multiple functions: it acts as a structural support, a radiation filter to block background interference, and an optical window to transmit substrate thermal radiation to the pyrometer, thereby reducing the need for additional complex components while maintaining measurement reliability
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach allows for more precise temperature measurement of moving substrates by reducing interference from processing sources and enabling continuous monitoring, leading to improved substrate processing quality and efficiency.
Implementation Method 1
a pyrometer (40) that is arranged on a second side of the table... The at least one first passage and the at least one second passage form an optically operative connection between the pyrometer and the side of a substrate... to receive radiation emitted from a second side of the substrate
Data Source
AI summary
A substrate processing apparatus is provided. The substrate processing apparatus includes a table rotatable around a first axis, a first holder being arranged in a non-rotatable or rotatable manner on a first side of the table and at least one means for processing a substrate in the first substrate plane and directing towards the first side of the table. Furthermore, the substrate processing apparatus includes a pyrometer being arranged on a second side of the table, the second side of the table facing away from the first side of the table, and an optically operative connection between the pyrometer and the side of a substrate, when positioned on the first holder, facing away from the at least one means for processing a substrate. Furthermore, a method of measuring the temperature of a moving substrate and the use of a substrate processing apparatus for measuring the temperature of a substrate are provided.