Pyrometric Temperature Measurement Correction Model
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing methods for determining temperature in rapid heating systems face challenges in accurately measuring substrate temperature due to dynamic processes and sudden changes in optical properties, leading to incorrect control of heating elements and system instability, especially with highly reflective wafers.
Innovation Solution
A method that calculates measurement values by comparing actual measurements with prediction values over time, correcting for deviations to ensure accurate temperature determination, and using a model system to adapt to changes in reflectivity and background radiation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Speed
If pyrometric temperature measurement systems are used to measure substrate temperature rapidly, then the response speed and measurement capability are improved, but the accuracy deteriorates due to interference from background radiation and sudden changes in optical properties
Solution Approach 1:
The patent implements feedback by continuously comparing actual pyrometric measurements with prediction values from a process model. When deviations are detected, the system automatically corrects the measurement values and adjusts the control variables, creating a closed-loop system that maintains accuracy despite rapid changes and radiation interference
Solution Approach 2:
The patent introduces a process model as an intermediary that predicts expected measurement values based on control variables and process knowledge. This model acts as a mediator between the raw pyrometric measurements and the final temperature determination, filtering out errors caused by background radiation and optical property changes
2Device complexity
If conventional measurement methods are used without correction, then the system complexity is reduced, but the reliability deteriorates due to incorrect temperature control and system instability
Solution Approach 1:
The system performs self-correction by automatically detecting deviations between actual and predicted measurements, then autonomously adjusting the measurement values and control variables without external intervention. This self-service mechanism ensures reliable temperature control while maintaining relatively simple system architecture
Solution Approach 2:
The patent replaces complex hardware-based correction mechanisms with a software/mathematical approach using process models and algorithmic corrections. This substitution achieves high reliability through computational methods rather than additional physical measurement devices
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach provides reliable and precise temperature measurement, reducing errors and system instability by correcting for sudden changes and dynamic processes, ensuring accurate control of heating elements.
Implementation Method 1
Contact-free temperature measurement systems establish the temperature for example by measuring radiation emitted from the object (self radiation)
Implementation Method 2
In order to heat a wafer to be treated according to a pre-specified temperature/time curve
Data Source
AI summary
The present invention describes a method for determining a value for the temperature, radiation, emissivity, transmissivity and/or reflectivity of an object (2) such as a semiconductor wafer in a rapid heating system (1), wherein an output signal from a radiation detector (50) which records temperature radiation from the object is used as a measurement value, and wherein prediction values for the measurement values are calculated in a model system (100). The development over time of the measurement values is compared with the development over time of the prediction values and the measurement value is corrected if the difference exceeds predetermined threshold value.