Quantum Dot Color Filter Substrate UV Selective Quenching
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Solution Overview
Problem
Current quantum dot (QD) color filter technologies for LCD TVs face challenges in achieving high color gamut and light utilization efficiency due to the large amount of QD material required and the use of white backlights, which reduces light efficiency.
Innovation Solution
A manufacturing method for a QD color filter substrate that uses high power UV irradiation on QD gel for selective quenching, simplifying the process and reducing costs, by patterning the QD layer without etching and utilizing a blue backlight with an organic transparent layer to enhance light efficiency.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Duration of action of stationary object
If QD film or QD tube made by mixing and sealing light-emitting band R (red) G (green) B (blue) quantum dots in plastic film or glass is used, then color gamut can be improved, but the amount of QD material required is relatively large
Solution Approach 1:
The patent extracts the blue quantum dot material from the system by selectively quenching it through UV irradiation, while retaining only the red and green QD materials in the gel layer. This reduces the total amount of QD material needed while maintaining color gamut performance through the blue backlight excitation of red and green QDs.
Solution Approach 2:
The patent applies different properties to different regions: the red and green sub-pixel areas contain QD materials that emit light when excited, while the blue sub-pixel areas have their QD materials selectively quenched to non-emissive state. This local differentiation allows the system to use fewer QD materials overall while maintaining full color capability.
2Duration of action of stationary object
If white backlight is used to excite mixed QD, then rich color gamut can be achieved, but light utilization efficiency declines
Solution Approach 1:
The patent changes the spectral parameters of the backlight from broad-spectrum white light to narrow-band blue light (wavelength 430-470 nm). This parameter change optimizes the excitation efficiency for red and green quantum dots while eliminating the energy waste associated with exciting blue quantum dots that are subsequently quenched.
Solution Approach 2:
The patent converts the potential harm of having blue QD material present (which would consume backlight energy without contributing to useful output) into a benefit by selectively quenching it. The blue backlight energy that would have been wasted exciting blue QDs is now fully utilized to excite red and green QDs, improving overall light utilization efficiency.
3Duration of action of stationary object
If conventional QD film or QD tube structure is used, then color gamut improvement is achieved, but manufacturing complexity remains high
Solution Approach 1:
The patent merges the color filter layer and quantum dot layer into a single integrated structure. The patterned color resist layers serve dual functions as both color filters and masks for selective UV irradiation, eliminating the need for separate manufacturing steps for color filters and QD patterning, thus simplifying the overall manufacturing process.
Solution Approach 2:
The patent performs preliminary patterning of the color resist layers before applying the quantum dot gel. This preliminary action creates the mask structure needed for subsequent selective UV irradiation, allowing the QD materials to be selectively quenched in the blue sub-pixel areas without requiring additional patterning steps afterward.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method achieves improved color gamut and simplifies the manufacturing process while reducing production costs by selectively quenching QD layers using UV light, eliminating the need for blue QD material and enhancing light utilization with blue backlights.
Implementation Method 1
using UV light to perform irradiation on the portion of the mask corresponding to blue sub-pixel areas for 3-40 hours, so that the irreversible fluorescence quenching occurring for the QD material in the QD gel located on the blue sub-pixel areas under long time UV light irradiation
Data Source
AI summary
The invention discloses a QD CF substrate and manufacturing method thereof. The manufacturing method uses high power UV light irradiation on the QD material in the QD gel for prolonged period of time to perform selective quenching to obtain a selectively quenched QD layer, i.e., patterning the QD layer without etching process, achieve simplifying the QD CF substrate manufacturing process and reduce production cost. The QD CF substrate uses selectively quenched QD layer obtain by UV light irradiation technology to achieve improve the color gamut of display as well as simplifying manufacturing process. Moreover, the QD layer comprises no blue QD material, but uses blue backlight and organic transparent photo-resist layer to improve light utilization efficiency as well as reduce material cost.